High Purity TMAH - Electronic Grade Chemical Structure
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High Purity TMAH

Ultra-pure tetramethylammonium hydroxide engineered for demanding semiconductor applications including silicon wafer processing, photoresist development, anisotropic etching, and advanced photolithography. Our electronic-grade TMAH delivers exceptional purity, consistent performance, and reliable results for critical semiconductor processes requiring superior chemical quality with stringent contamination control standards.

  • 99.999% (5N) Ultra-High Purity
  • Electronic Grade Quality
  • Low Metal Content <1ppm
  • Photolithography Compatible
  • Cleanroom Packaged
  • Silicon Etching Applications
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Technical Specifications

Chemical Formula: (CH₃)₄NOH
CAS Number: 75-59-2
Molecular Weight: 91.15 g/mol
Purity: ≥ 99.9%
Physical State: Colorless liquid
Concentration: 25% aqueous solution
Density (25°C): 1.016 g/cm³
pH (25°C): 13.5-14.0
Metal Content (total): ≤ 10 ppm
Chloride (Cl⁻): ≤ 1 ppm
Storage Temperature: 15-25°C
Packaging Options: 1L, 20L drums, IBC containers

Applications

Semiconductor Manufacturing
MEMS Device Fabrication
Silicon Etching
Photovoltaic Processing
Thin Film Processing
Optical Device Manufacturing
Display Panel Production
IC Fabrication
Aerospace Electronics
Medical Device Components
RF/Microwave Devices
Research & Development

Industry-Specific Grades

DRAVYOM offers specialized TMAH grades with different purity levels and metal content specifications, optimized for various semiconductor and MEMS manufacturing requirements.

Semiconductor Grade
Purity: ≥ 99.9% Metal Content: ≤ 1 ppm Application: IC fabrication Standard: SEMI specifications
MEMS Grade
Purity: ≥ 99.95% Particles: Ultra-low Application: MEMS devices Quality: Cleanroom compatible
Photovoltaic Grade
Purity: ≥ 99.5% Alkalinity: Controlled Application: Solar cell processing Efficiency: Optimized etching
Research Grade
Purity: ≥ 99.0% Concentration: Various options Application: R&D laboratories Packaging: Small volumes

Quality Standards

DRAVYOM's TMAH is manufactured under stringent quality control protocols, meeting international semiconductor industry standards. Our production ensures ultra-high purity and consistent performance for critical electronic applications.

ISO 9001:2015 Certified Manufacturing
SEMI Standards Compliance
≥99.9% Guaranteed Purity
Advanced Purity Testing
Semiconductor Grade Quality
Ultra-Low Metal Content
Certificate of Analysis
Cleanroom Compatible Packaging

Advanced Chemical Properties & Performance

TMAH (Tetramethylammonium Hydroxide) exhibits exceptional silicon etching properties with quaternary ammonium chemistry. Its anisotropic etching characteristics provide superior crystallographic selectivity, excellent surface quality, and outstanding compatibility for MEMS and semiconductor applications.

Chemical Properties
Chemical Formula: (CH3)4NOH
Molecular Weight: 91.15 g/mol
Concentration Range: 2.38-25% aqueous solution
pH Value: 13-14 (highly alkaline)
Physical Properties
Appearance: Clear colorless liquid
Density (25%): 1.12 g/cm³ at 20°C
Viscosity: 1.2-2.0 cP at 20°C
Freezing Point: < -20°C (25% solution)
Etching Properties
Silicon Etch Rate: 0.5-2.0 μm/min at 80°C
Anisotropy Ratio: (100):(111) = 35:1 to 60:1
Surface Roughness: < 1 nm RMS on (111)
Selectivity: High Si/SiO2 selectivity
Semiconductor Grade Standards
Purity: ≥ 99.999% (electronics grade)
Metal Impurities: < 10 ppb total
Particles: < 30 particles/ml (>0.1 μm)
Organics: < 100 ppb total organic carbon
Process Parameters
Operating Temperature: 70-90°C optimum
Activation Energy: 0.6 eV for (100) Si
Mask Compatibility: SiO2, Si3N4, metals
Shelf Life: 18 months in HDPE

Performance Characteristics

Performance metrics demonstrate TMAH effectiveness in precision silicon micromachining with superior anisotropic etching, excellent surface quality, and outstanding crystallographic selectivity for advanced MEMS and semiconductor applications.

Anisotropic Etching

Ratio: (100):(111) = 35:1 to 60:1

Precision crystal orientation
Surface Quality

Roughness: < 1 nm RMS on (111)

Ultra-smooth surfaces
Selectivity

Performance: High Si/SiO2 selectivity

Precise pattern transfer
Purity Grade

Quality: 99.999% semiconductor grade

Ultra-low contamination
Temperature Control

Range: 70-90°C optimum operation

Controlled process conditions
MEMS Compatible

Application: Micromachining processes

Advanced device fabrication

Safety Information

Highly alkaline solution causing severe burns to skin and eyes. May be fatal if swallowed. Use in well-ventilated areas with appropriate PPE including chemical-resistant gloves, safety glasses, and protective clothing. Emergency eyewash and shower stations required.

Highly Corrosive
Toxic if Swallowed
Severe Eye Burns

Storage & Handling

Store in HDPE or PTFE containers in well-ventilated areas away from metals and organic materials. Use secondary containment systems and maintain temperature control. Avoid contamination from CO2 which can form precipitates.

Store at 15-25°C
Alkaline ventilation
HDPE/PTFE containers
Semiconductor storage standards

Chemical Mechanisms & Reaction Pathways

TMAH demonstrates controlled silicon etching mechanisms through alkaline chemistry, enabling predictable semiconductor processing with well-characterized selectivity and etch rates for reliable microelectronics manufacturing.

Silicon Etching

Anisotropic silicon etching with excellent crystallographic selectivity

Primary semiconductor mechanism
Developer Chemistry

Photoresist development with high resolution and clean patterns

Precise lithography control
Pattern Fidelity

Excellent pattern transfer with minimal feature distortion

Superior semiconductor quality
Temperature Control

Stable processing across semiconductor temperature ranges

Reliable electronics manufacturing

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures safe use in semiconductor manufacturing with complete documentation packages supporting electronics industry standards and cleanroom requirements.

Semiconductor Standards

SEMI and semiconductor manufacturing compliance standards

Electronics Compliance

Cleanroom and semiconductor processing regulations

Safety Documentation

Semiconductor worker safety and alkaline handling protocols

International Standards

Global semiconductor and microelectronics regulations

Quality Documentation

Complete semiconductor-grade certifications and analysis

Transportation

Specialized handling protocols for alkaline semiconductor chemicals

Technical Support & Value-Added Services

DRAVYOM's semiconductor technology support team provides comprehensive guidance, etching process expertise, and cleanroom consulting to optimize TMAH performance in semiconductor applications.

Semiconductor Services
  • Etching process optimization
  • Etch rate calibration
  • Pattern development support
  • Cleanroom process consulting
Technical Testing
  • Etch rate characterization
  • Selectivity evaluation
  • Contamination analysis
  • Process parameter optimization
Process Development
  • Manufacturing process design
  • Cleanroom protocols
  • Yield optimization
  • Quality control systems
Supply Solutions
  • Cleanroom-grade packaging
  • Ultra-pure logistics
  • Technical consultation
  • Custom purity services

Environmental Impact & Sustainability

Our TMAH represents sustainable semiconductor technology through efficient material utilization, waste minimization, and responsible manufacturing supporting green electronics initiatives.

Material Efficiency

Optimized etching with minimal waste generation

Water Conservation

Efficient rinsing and cleaning protocols

Process Efficiency

Streamlined semiconductor manufacturing with reduced environmental impact

Controlled Chemistry

Precise chemical control minimizing environmental exposure

Green Electronics

Supporting sustainable semiconductor and electronics manufacturing

Waste Treatment

Compatible with semiconductor waste treatment systems

Manufacturing Excellence & Quality Control

DRAVYOM's semiconductor-grade manufacturing facility employs ultra-pure processing technology and stringent quality monitoring systems to ensure consistent TMAH quality and semiconductor performance.

Ultra-Pure Processing

Cleanroom manufacturing with controlled contamination levels

Semiconductor excellence
Quality Testing

Comprehensive testing including purity, metals content, and performance

Rigorous semiconductor standards
Quality Systems

ISO 9001:2015 and semiconductor industry certified operations

Electronics industry excellence
Cleanroom Packaging

Ultra-clean packaging with contamination prevention

Maintaining semiconductor quality

Market Applications & Performance Data

Comprehensive performance data demonstrating TMAH effectiveness across semiconductor applications with validated etching performance and superior processing quality.

Semiconductor Etching
Etch Rate: Controlled 0.5-2.0 μm/min silicon etching Selectivity: >100:1 silicon to silicon dioxide selectivity Anisotropy: Excellent crystallographic etching control
Photolithography
Resolution: Sub-micron pattern development capability Contrast: High contrast with clean pattern edges Reproducibility: Consistent results across wafer batches
MEMS Manufacturing
Precision: Excellent dimensional control for MEMS structures Surface Quality: Smooth etched surfaces with minimal roughness Yield: High manufacturing yield with consistent quality

DRAVYOM Competitive Advantages

Semiconductor Expertise

Deep understanding of semiconductor processing and cleanroom requirements

Ultra-Pure Chemistry

Advanced purification technology with proven semiconductor benefits

Precision Manufacturing

Exceptional etching control with superior pattern fidelity

Quality Assurance

Comprehensive quality control ensuring consistent semiconductor performance

Semiconductor Partnership

Collaborative approach with semiconductor manufacturers and electronics companies

Market Leadership

Leading provider of semiconductor chemicals in the Indian electronics market