TMAH Silicon Etchants
Electronic Premium
Electronic Grade Chemical

TMAH Silicon Etchants

Ultra-pure electronic grade TMAH Silicon Etchants manufactured to meet stringent semiconductor industry specifications. Our Tetramethylammonium Hydroxide based solutions provide exceptional silicon etching performance with ultra-low contamination for critical semiconductor processing.

  • Electronic Grade Purity
  • Ultra-Low Contamination
  • Superior Silicon Etching
  • Semiconductor Compatible
  • Precise Etch Control
  • Consistent Quality

Electronics Excellence Demands Ultra-Pure Chemicals

Get electronic grade TMAH Silicon Etchants for semiconductor manufacturing, explore custom formulations, or discuss process optimization with our electronics specialists.

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Technical Specifications

TMAH Concentration: 2.38-25 wt%
Etch Rate (Si): 0.5-2.0 μm/min
Selectivity (Si:SiO₂): 1000:1 to 10000:1
Metal Impurities: ≤ 0.1 ppm total
Particle Count: ≤ 20 per mL
pH Range: 12.0-14.0
Operating Temperature: 60-90°C
Anisotropy: High (100:1)
Shelf Life: 12 months at RT
Packaging: 1L, 4L, 20L containers

Applications

Silicon Etching
MEMS Manufacturing
Anisotropic Etching
Wafer Processing
Semiconductor Manufacturing
Device Fabrication
Bulk Micromachining
Chemical Processing
Process Development
Quality Control
Electronic Manufacturing
R&D Applications

Industry-Specific Grades

DRAVYOM offers specialized TMAH silicon etchant grades tailored for specific electronic applications, ensuring optimal performance and regulatory compliance across diverse manufacturing requirements.

MEMS Grade
TMAH Concentration: 25 wt% Etch Rate: 1.0-2.0 μm/min Anisotropy: High Application: MEMS devices
Semiconductor Grade
TMAH Concentration: 2.38 wt% Metal Impurities: ≤ 0.01 ppm Selectivity: 10000:1 Application: IC manufacturing
Precision Grade
TMAH Concentration: 5-10 wt% Etch Rate: 0.5-1.0 μm/min Uniformity: Excellent Application: Precision etching
Research Grade
TMAH Concentration: 2.38-25 wt% Batch Consistency: ±2% Documentation: Complete Application: R&D work

Quality Standards

DRAVYOM's TMAH Silicon Etchants are manufactured under stringent quality control protocols, meeting international electronics standards including SEMI, ASTM, and ISO specifications. Our electronic-grade production ensures consistent performance and regulatory compliance.

ISO 9001:2015 Certified Manufacturing
SEMI Standards Compliance
Controlled Etch Rate
Advanced Quality Testing
Ultra-Low Metal Impurities
Batch-to-Batch Consistency
Traceable Certificate of Analysis
Controlled Environment Storage

Advanced Chemical Properties & Performance

Electronic Grade TMAH Silicon Etchants exhibit exceptional chemical properties essential for semiconductor manufacturing applications. Their ultra-pure composition and precise formulation ensure reliable performance in demanding silicon etching and micromachining processes.

Chemical Properties
Molecular Weight: 91.15 g/mol
Concentration Range: 2.38-25 wt% TMAH
Anisotropic Ratio: 100:1 to 10000:1
Activation Energy: 0.6-0.8 eV
Physical Properties
Density: 1.01-1.10 g/cm³
Viscosity: 1.2-2.5 cP (25°C)
Surface Tension: 30-40 mN/m
Boiling Point: 102-110°C
Etching Properties
Etch Rate (Si): 0.5-3.0 μm/min
Selectivity (Si/SiO₂): 100:1 to 10000:1
Uniformity: ±2% across wafer
Surface Roughness: ≤1 nm Ra
Purity Specifications
TMAH Purity: ≥99.5%
Metal Impurities: ≤0.01 ppm each
Organic Impurities: ≤1 ppm
Particle Count: ≤10 particles/mL
Stability Properties
Shelf Life: 12 months (proper storage)
Temperature Stability: Stable 70-90°C
Light Sensitivity: Minimal degradation
Container Compatibility: PTFE, PFA, quartz

Performance Characteristics

Detailed performance metrics demonstrate Electronic Grade TMAH Silicon Etchants superiority in semiconductor processing applications with exceptional precision, uniformity, and reproducibility across diverse silicon etching and micromachining processes.

Etching Performance

Uniformity: ±2% across wafer surface

Exceptional precision for MEMS
Selectivity

Ratio: 100:1 to 10000:1 (Si/SiO₂)

Outstanding anisotropic etching
Process Control

Reproducibility: ±1% batch-to-batch

Consistent manufacturing results
Temperature Range

Operating: 70-90°C stable performance

Optimal etching conditions
Purity Level

Grade: ≥99.5% TMAH purity

Ultra-pure etchant
Etch Rate

Rate: 0.5-3.0 μm/min controlled

Optimized processing speed

Safety Information

Corrosive and caustic solution that can cause severe burns and respiratory damage. Handle in well-ventilated areas with appropriate protective equipment including chemical-resistant gloves, safety goggles, and protective clothing. Ensure proper emergency procedures and spill response protocols are in place.

Corrosive
Respiratory Irritant
Eye/Skin Damage

Storage & Handling

Store in original chemical-resistant containers in cool, dry, well-ventilated areas away from acids and metals. Keep containers tightly sealed and maintain proper temperature control. Use only with appropriate chemical handling equipment and follow all caustic solution safety protocols.

Cool storage (15-25°C)
Adequate ventilation required
Chemical-resistant containers
Emergency shower/eyewash
Acid-incompatible storage
Secure chemical storage

Chemical Mechanisms & Reaction Pathways

TMAH silicon etchants exhibit selective alkaline etching chemistry enabling controlled silicon removal with predictable reaction pathways and anisotropic etching characteristics for semiconductor device fabrication.

Alkaline Etching

Controlled alkaline chemistry for selective silicon removal

Predictable etch rates and selectivity
Anisotropic Etching

Crystal-oriented etching for precise feature definition

Excellent pattern transfer capability
Surface Quality

Smooth etch surfaces with minimal damage

Optimized surface morphology
Temperature Control

Temperature-dependent etch rates for process control

Predictable and reproducible results

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures global semiconductor facility access with complete documentation packages supporting international standards and semiconductor manufacturing process validations.

SEMI Standards

Semiconductor Equipment and Materials International compliance

Electronic Grade

Ultra-high purity specifications for semiconductor manufacturing

Etchant Grade Quality

Optimized specifications for silicon etching applications

REACH Registration

European Union chemical regulation compliance

Process Validation

Supported semiconductor process validation documentation

SDS Documentation

Multi-language Safety Data Sheets (16 sections, GHS compliant)

Technical Support & Value-Added Services

DRAVYOM's semiconductor process engineering team provides comprehensive silicon etching support, process optimization assistance, and technical services to optimize TMAH Silicon Etchants performance in your specific manufacturing applications.

Process Development
  • Silicon etching process optimization
  • Temperature and concentration optimization
  • Etch rate and selectivity analysis
  • Custom etching procedures
Analytical Services
  • Etch profile characterization
  • Solution purity verification
  • Surface quality analysis
  • Process monitoring support
Technical Support
  • Etching equipment troubleshooting
  • Process setup and optimization
  • Safety training and protocols
  • Manufacturing best practices
Supply Solutions
  • Custom concentration specifications
  • Emergency supply arrangements
  • Specialized packaging options
  • Global semiconductor facility support

Environmental Impact & Sustainability

Our TMAH Silicon Etchants production emphasizes environmental responsibility through sustainable manufacturing practices, waste minimization, and comprehensive environmental impact management for semiconductor manufacturing operations.

Chemical Recovery

Advanced chemical recovery and regeneration systems

Water Treatment

Advanced wastewater treatment and recycling systems

Clean Production

Energy-efficient manufacturing with emission controls

Safe Disposal

Comprehensive guidance for semiconductor waste management

ISO 14001

Environmental management system certified production

Carbon Footprint

Optimized transportation and packaging solutions

Manufacturing Excellence & Quality Control

DRAVYOM's state-of-the-art electronic chemical manufacturing facility employs advanced formulation technology and continuous monitoring systems to ensure consistent TMAH Silicon Etchants quality and performance across all production batches.

Production Process

Advanced synthesis and purification in controlled environment

Multi-stage purification for etchant grade quality
Quality Testing

Comprehensive testing including metals, organics, and etch performance

ICP-MS verification and etch rate testing
Quality Systems

ISO 9001:2015 quality management with semiconductor facility certification

Continuous improvement and process validation
Packaging Control

Chemical-resistant containers with contamination prevention systems

Solution stability and shelf-life assurance

Market Applications & Performance Data

Comprehensive semiconductor manufacturing data demonstrating TMAH Silicon Etchants effectiveness across diverse silicon etching applications with quantified performance metrics and process validations.

Semiconductor Fabs
Etch Rate: Controlled 0.5-5 μm/min Selectivity: >1000:1 silicon vs. oxide Process Yield: 99.9% device quality
Research Facilities
Etch Quality: Anisotropic silicon etching Reproducibility: >99% batch consistency Innovation: Advanced device support
Manufacturing Lines
Reliability: 99.9% process consistency Throughput: Optimized etching cycles Cost Efficiency: Reduced chemical consumption

DRAVYOM Competitive Advantages

Superior Selectivity

Consistently exceeds etchant grade specifications with ultra-high selectivity and exceptional etching performance

Reliable Supply

Guaranteed availability with strategic inventory management and electronic chemical production scheduling

Etching Expertise

Dedicated process engineering team provides etching development and manufacturing support

Quality Assurance

Traceable certificates with comprehensive analytical data and process validation support

Global Standards

International compliance with SEMI and etchant grade specifications

Partnership Approach

Collaborative relationships with semiconductor facilities and custom process development