Tetrafluoromethane
Electronics Ultra-Pure
Electronics Chemical

Tetrafluoromethane (CF4)

Premium electronics grade Tetrafluoromethane manufactured to meet stringent semiconductor industry specifications for etching and plasma processing. Provides exceptional gas purity and consistency with ultra-high quality control for advanced semiconductor manufacturing processes.

  • Electronics Grade Purity
  • Precision Etching Gas
  • Plasma Processing Compatible
  • Ultra-Low Contamination
  • Consistent Gas Quality
  • Advanced Semiconductor Processing
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Technical Specifications

Purity: ≥99.9%
Moisture Content: ≤ 2 ppm
Oxygen Content: ≤ 5 ppm
Nitrogen Content: ≤ 50 ppm
CO₂ Content: ≤ 10 ppm
Etch Rate: High selectivity
Delivery Pressure: 10-50 psig
Boiling Point: -128°C
Shelf Life: 24 months at RT
Packaging: Specialty gas cylinders

Applications

Plasma Etching
Semiconductor Processing
Reactive Ion Etching
Chamber Cleaning
Dielectric Etching
Memory Device Manufacturing
Process Equipment
Chemical Processing
Process Development
Quality Control
Electronic Manufacturing
R&D Applications

Industry-Specific Grades

DRAVYOM offers specialized tetrafluoromethane grades tailored for specific electronic applications, ensuring optimal performance and regulatory compliance across diverse manufacturing requirements.

Semiconductor Grade
Purity: ≥99.9% Moisture: ≤ 1 ppm Oxygen: ≤ 2 ppm Application: IC manufacturing
Etching Grade
Purity: ≥99.8% Etch Rate: High Selectivity: Excellent Application: Plasma etching
Cleaning Grade
Purity: ≥99.5% Cleaning Power: High Residue: Minimal Application: Chamber cleaning
Research Grade
Purity: ≥99.0% Batch Consistency: ±0.5% Documentation: Complete Application: R&D work

Quality Standards

DRAVYOM's Tetrafluoromethane is manufactured under stringent quality control protocols, meeting international electronics standards including SEMI, ASTM, and ISO specifications. Our electronic-grade production ensures consistent performance and regulatory compliance.

ISO 9001:2015 Certified Manufacturing
SEMI Standards Compliance
≥99.9% Purity Guarantee
Advanced Quality Testing
Ultra-Low Impurity Levels
Batch-to-Batch Consistency
Traceable Certificate of Analysis
Specialty Gas Handling

Advanced Chemical Properties & Performance

Electronic Grade Tetrafluoromethane exhibits exceptional chemical properties essential for semiconductor manufacturing applications. Its ultra-pure composition and precise formulation ensure reliable performance in demanding electronic processing and plasma applications.

Chemical Properties
Molecular Weight: 88.00 g/mol
Bond Strength: Very high (C-F bonds)
Ionization Energy: 15.9 eV
Etching Selectivity: High for silicon compounds
Physical Properties
Boiling Point: -127.8°C
Melting Point: -183.6°C
Density (gas): 3.72 kg/m³ (0°C)
Vapor Pressure: 3.73 MPa (25°C)
Plasma Properties
Dissociation Energy: Moderate (plasma-stable)
Etch Rate: High for silicon materials
Plasma Stability: Excellent
Byproduct Formation: Minimal volatile compounds
Purity Specifications
Purity: ≥99.9%
Moisture Content: ≤1 ppm
Oxygen Content: ≤2 ppm
Nitrogen Content: ≤5 ppm
Stability Properties
Shelf Life: Indefinite (proper storage)
Chemical Stability: Very stable
Temperature Stability: Stable -50 to +80°C
Container Compatibility: Stainless steel, PTFE

Performance Characteristics

Detailed performance metrics demonstrate Electronic Grade Tetrafluoromethane superiority in semiconductor processing applications with exceptional precision, uniformity, and reproducibility across diverse plasma etching and cleaning processes.

Etching Performance

Uniformity: ±1.5% across wafer surface

Exceptional precision for device fabrication
Plasma Stability

Consistency: >99.5% throughout process

Highly stable plasma generation
Process Control

Reproducibility: ±0.3% batch-to-batch

Consistent manufacturing results
Temperature Range

Operating: -50 to +80°C stable

Flexible processing conditions
Purity Level

Grade: ≥99.9% electronic grade

Ultra-pure gas supply
Process Speed

Rate: Optimized for high throughput

Enhanced manufacturing efficiency

Safety Information

Tetrafluoromethane is a potent greenhouse gas and compressed gas that requires proper handling protocols. Handle in well-ventilated areas with appropriate leak detection systems, protective equipment, and emergency response procedures. Follow all environmental regulations and ensure proper gas recovery and disposal systems.

Compressed Gas
Asphyxiant
Greenhouse Gas

Storage & Handling

Store in original high-pressure gas cylinders in well-ventilated areas away from heat sources and ignition sources. Maintain proper pressure monitoring and leak detection systems. Use only with appropriate gas handling equipment and follow all compressed gas safety protocols and environmental regulations.

Temperature control (-50 to +80°C)
Adequate ventilation required
High-pressure gas cylinders
Leak detection systems
Environmental monitoring
Gas recovery systems

Chemical Mechanisms & Reaction Pathways

Tetrafluoromethane exhibits excellent plasma chemistry and etching characteristics enabling controlled material removal with predictable reaction pathways and quantitative etch rates for semiconductor device manufacturing.

Plasma Dissociation

RF activation creates highly reactive fluorine species

Consistent etching chemistry
Selective Etching

High selectivity for silicon and oxide materials

Precise pattern definition capability
Process Stability

Stable plasma characteristics for reproducible etching

Excellent process control
Temperature Independence

Wide operating temperature range for flexibility

Versatile processing conditions

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures global semiconductor facility access with complete documentation packages supporting international standards and environmental regulations for specialty gas applications.

SEMI Standards

Semiconductor Equipment and Materials International compliance

Electronic Grade

Ultra-high purity specifications for semiconductor manufacturing

Plasma Grade Quality

Optimized purity for plasma etching applications

Environmental Regulations

Kyoto Protocol and greenhouse gas emission compliance

Process Validation

Supported semiconductor process validation documentation

SDS Documentation

Multi-language Safety Data Sheets (16 sections, GHS compliant)

Technical Support & Value-Added Services

DRAVYOM's semiconductor process engineering team provides comprehensive plasma etching support, process optimization assistance, and technical services to optimize Tetrafluoromethane performance in your specific manufacturing applications.

Process Development
  • Plasma etching process optimization
  • RF power and pressure optimization
  • Etch rate and selectivity analysis
  • Custom etching procedures
Analytical Services
  • Etch profile characterization
  • Gas purity verification
  • Plasma uniformity testing
  • Process monitoring support
Technical Support
  • Plasma equipment troubleshooting
  • Gas delivery system optimization
  • Safety training and protocols
  • Manufacturing best practices
Supply Solutions
  • Specialized gas cylinder management
  • Emergency supply arrangements
  • Gas recovery and recycling programs
  • Global semiconductor facility support

Environmental Impact & Sustainability

Our Tetrafluoromethane production emphasizes environmental responsibility through sustainable manufacturing practices, emission minimization, and comprehensive greenhouse gas management for semiconductor manufacturing operations.

Gas Recovery

Advanced recovery and recycling systems for emission reduction

Clean Production

Energy-efficient synthesis with emission controls

GHG Management

Greenhouse gas monitoring and emission reduction programs

Environmental Compliance

Kyoto Protocol and international environmental regulations

ISO 14001

Environmental management system certified production

Emission Control

Advanced abatement systems for facility operations

Manufacturing Excellence & Quality Control

DRAVYOM's state-of-the-art specialty gas manufacturing facility employs advanced purification technology and continuous monitoring systems to ensure consistent Tetrafluoromethane quality and performance across all production batches.

Production Process

Advanced synthesis and purification in controlled inert atmosphere

Multi-stage purification for electronic grade quality
Quality Testing

Comprehensive gas analysis including moisture and trace impurities

GC-MS verification and plasma performance testing
Quality Systems

ISO 9001:2015 quality management with specialty gas certification

Continuous improvement and process validation
Packaging Control

High-pressure cylinders with advanced valve technology

Leak prevention and gas purity maintenance

Market Applications & Performance Data

Comprehensive semiconductor manufacturing data demonstrating Tetrafluoromethane effectiveness across diverse plasma etching applications with quantified performance metrics and process validations.

Semiconductor Fabs
Etch Rate: Controlled 200-2000 Å/min Selectivity: >100:1 silicon vs. resist Process Yield: 99.9% device quality
Research Facilities
Plasma Quality: High uniformity etching Reproducibility: >99% batch consistency Innovation: Advanced device support
Manufacturing Lines
Reliability: 99.9% process consistency Throughput: Optimized etching cycles Environmental: Reduced emissions with recovery

DRAVYOM Competitive Advantages

Superior Purity

Consistently exceeds electronic grade specifications with ultra-low impurities and exceptional plasma performance

Reliable Supply

Guaranteed availability with strategic inventory management and specialty gas production scheduling

Plasma Expertise

Dedicated process engineering team provides etching development and manufacturing support

Quality Assurance

Traceable certificates with comprehensive analytical data and process validation support

Environmental Leadership

Advanced recovery systems and environmental compliance programs

Partnership Approach

Collaborative relationships with semiconductor facilities and environmental stewardship