SC-1 Standard Clean (NH4OH/H2O2/H2O)
Electronic Premium
Electronic Grade Chemical

SC-1 Standard Clean (NH₄OH/H₂O₂/H₂O)

Ultra-pure electronic grade SC-1 Standard Clean solution manufactured to meet stringent semiconductor industry specifications. Our cleaning solution provides exceptional cleaning performance with ultra-low contamination for critical semiconductor processing and advanced wafer cleaning applications.

  • Electronic Grade Purity
  • Ultra-Low Contamination
  • Superior Cleaning Performance
  • Semiconductor Compatible
  • Excellent Cleaning Efficiency
  • Consistent Quality
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Electronics Excellence Demands Ultra-Pure Chemicals

Get electronic grade SC-1 Standard Clean solutions for semiconductor manufacturing, explore custom formulations, or discuss process optimization with our electronics specialists.

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Technical Specifications

Composition: NH₄OH:H₂O₂:H₂O (1:1:5)
pH Range: 10.5-11.5
Operating Temperature: 70-80°C
Particle Count: ≤ 10 per mL
Metal Impurities: ≤ 0.1 ppm total
Organic Impurities: ≤ 1 ppm
Conductivity: ≤ 1 μS/cm
Cleaning Efficiency: >99.9% particle removal
Shelf Life: 6 months at 25°C
Packaging: 1L, 5L, 25L containers

Applications

Wafer Cleaning
Organic Contamination Removal
Particle Removal
Semiconductor Processing
Pre-Deposition Cleaning
Optical Component Cleaning
MEMS Device Cleaning
Precision Cleaning
Surface Preparation
Quality Control
Electronic Manufacturing
Research Applications

Industry-Specific Grades

DRAVYOM offers specialized SC1 solutions tailored for specific cleaning applications, ensuring optimal performance and regulatory compliance across diverse manufacturing requirements.

Semiconductor Grade
Purity: ≥99.99% Particle Count: ≤ 5 per mL Metal Impurities: ≤ 0.01 ppm Application: IC manufacturing
MEMS Grade
Purity: ≥99.9% Organic Impurities: ≤ 0.5 ppm Conductivity: ≤ 0.5 μS/cm Application: MEMS fabrication
Optical Grade
Purity: ≥99.8% Optical Clarity: High Residue: ≤ 0.001% Application: Optical cleaning
Research Grade
Purity: ≥99.5% Batch Consistency: ±0.1% Documentation: Complete Application: R&D work

Quality Standards

DRAVYOM's SC1 Standard Clean solutions are manufactured under stringent quality control protocols, meeting international electronics standards including SEMI, ASTM, and ISO specifications. Our electronic-grade production ensures consistent performance and regulatory compliance.

ISO 9001:2015 Certified Manufacturing
SEMI Standards Compliance
Controlled pH and Composition
Advanced Quality Testing
Ultra-Low Impurity Levels
Batch-to-Batch Consistency
Traceable Certificate of Analysis
Temperature-Controlled Storage

Advanced Chemical Properties & Performance

Electronic Grade SC1 Standard Clean exhibits exceptional chemical properties essential for precision silicon wafer cleaning applications. The ultra-pure composition and controlled chemistry ensure reliable performance in demanding organic contamination removal and surface preparation processes.

Chemical Properties
Composition: NH₄OH:H₂O₂:H₂O (1:1:5)
pH (25°C): 11.0-11.5
Oxidation Potential: Strong oxidizing
Cleaning Mechanism: Oxidative dissolution
Physical Properties
Operating Temperature: 70-80°C optimal
Solution Stability: 2-4 hours at 80°C
Vapor Generation: NH₃ and O₂ evolution
Density (25°C): 1.02-1.05 g/mL
Cleaning Properties
Organic Removal: Complete dissolution
Particle Removal: ≥ 99% efficiency
Metal Contamination: Minimal deposition
Surface Roughness: Smooth, clean surface
Purity Specifications
NH₄OH Purity: ≥ 25% electronic grade
H₂O₂ Purity: ≥ 30% electronic grade
Metal Impurities: ≤ 1 ppb total
Water Quality: 18.2 MΩ·cm resistivity
Process Properties
Cleaning Time: 10-15 minutes
Etch Rate (Si): < 0.1 Å/min
Selectivity: High for organics
Compatibility: CMOS process

Performance Characteristics

Detailed performance metrics demonstrate Electronic Grade SC1 Standard Clean superiority in silicon wafer cleaning applications with exceptional organic removal efficiency, controlled surface preparation, and reliable performance for critical semiconductor device fabrication.

Organic Removal

Complete dissolution

Superior cleaning
Ultra-Low Metals

≤ 1 ppb total

Contamination-free
High Particle Removal

≥ 99% efficiency

Clean surface
Surface Protection

Minimal silicon etch

Controlled process
Temperature Control

70-80°C operation

Optimized cleaning
CMOS Compatible

Process qualified

Device fabrication

Safety Information

Strong alkaline oxidizing solution that causes severe burns and generates ammonia vapors. May cause severe respiratory damage and systemic toxicity. Handle with extreme caution using appropriate protective equipment including chemical-resistant materials and ensure comprehensive ventilation and gas monitoring systems.

Corrosive/Oxidizing
Toxic Vapors
Oxidizing Agent

Storage & Handling

Prepare fresh solutions before use due to limited stability. Store individual components separately in cool, well-ventilated areas with appropriate safety systems. Use only with chemical-resistant equipment and ensure comprehensive gas monitoring and emergency response procedures.

Fresh preparation required
Gas monitoring systems
Excellent ventilation
Chemical-resistant equipment

Chemical Mechanisms & Reaction Pathways

SC1 Standard Clean exhibits strong oxidizing properties through hydrogen peroxide activation by ammonium hydroxide, creating controlled silicon surface cleaning with predictable reaction pathways and quantitative particle removal.

Oxidative Cleaning

H₂O₂ activation creates hydroxyl radicals for organic contaminant removal

Controlled oxidation for surface preparation
Particle Mobilization

Alkaline environment creates electrostatic repulsion for particle removal

Efficient cleaning mechanism for silicon surfaces
Surface Passivation

Formation of stable hydroxyl groups on silicon surfaces

Prevents surface contamination and oxidation
Metal Complexation

Ammonia complexes transition metals for removal from surfaces

Eliminates metallic contamination effectively

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures global semiconductor facility access with complete documentation packages supporting international standards and semiconductor manufacturing process validations.

SEMI Standards

Semiconductor Equipment and Materials International compliance

ASTM Standards

American Society for Testing and Materials semiconductor specifications

Electronic Grade

Ultra-high purity specifications for semiconductor manufacturing

REACH Registration

European Union chemical regulation compliance

Process Validation

Supported semiconductor process validation documentation

SDS Documentation

Multi-language Safety Data Sheets (16 sections, GHS compliant)

Technical Support & Value-Added Services

DRAVYOM's semiconductor process engineering team provides comprehensive method support, process optimization assistance, and technical services to optimize SC1 Standard Clean performance in your specific manufacturing applications.

Process Development
  • Cleaning process optimization support
  • Temperature and time optimization
  • Contamination analysis and control
  • Custom cleaning procedures
Analytical Services
  • Surface contamination analysis
  • Particle counting and sizing
  • Metal contamination testing
  • Process monitoring support
Technical Support
  • Process troubleshooting consultation
  • Equipment setup and optimization
  • Safety training and protocols
  • Manufacturing best practices
Supply Solutions
  • Just-in-time delivery systems
  • Emergency supply arrangements
  • Custom packaging and volumes
  • Global semiconductor facility support

Environmental Impact & Sustainability

Our SC1 Standard Clean production emphasizes environmental responsibility through sustainable manufacturing practices, waste minimization, and comprehensive environmental impact management for semiconductor manufacturing operations.

Waste Minimization

Optimized formulation with minimal waste generation

Water Treatment

Advanced wastewater treatment and recycling systems

Clean Production

Energy-efficient manufacturing with emission controls

Safe Disposal

Comprehensive guidance for semiconductor waste management

ISO 14001

Environmental management system certified production

Carbon Footprint

Optimized transportation and packaging solutions

Manufacturing Excellence & Quality Control

DRAVYOM's state-of-the-art semiconductor chemical manufacturing facility employs advanced purification technology and continuous monitoring systems to ensure consistent SC1 Standard Clean quality and performance across all production batches.

Production Process

Advanced purification and blending in controlled clean-room environment

Multi-stage purification for electronic grade quality
Quality Testing

Comprehensive testing protocol including metals, particles, and organic impurities

ICP-MS verification and particle counting analysis
Quality Systems

ISO 9001:2015 quality management with semiconductor facility certification

Continuous improvement and process validation
Packaging Control

Ultra-clean packaging with inert atmosphere protection

Contamination prevention and stability assurance

Market Applications & Performance Data

Comprehensive semiconductor manufacturing data demonstrating SC1 Standard Clean effectiveness across diverse applications with quantified performance metrics and process validations.

Semiconductor Fabs
Particle Removal: >99% efficiency Metal Contamination: <1 ppb total Process Yield: 99.9% device quality
Research Facilities
Surface Quality: AFM verified smoothness Reproducibility: >99% batch consistency Innovation: Next-gen device support
Manufacturing Lines
Reliability: 99.9% process consistency Throughput: 30% faster cleaning cycles Cost Efficiency: Reduced chemical consumption

DRAVYOM Competitive Advantages

Superior Purity

Consistently exceeds electronic grade specifications with ultra-low impurities and exceptional semiconductor performance

Reliable Supply

Guaranteed availability with strategic inventory management and semiconductor-grade production scheduling

Semiconductor Expertise

Dedicated process engineering team provides method development and manufacturing support

Quality Assurance

Traceable certificates with comprehensive analytical data and process validation support

Global Standards

International compliance with SEMI, ASTM, and electronic grade specifications

Partnership Approach

Collaborative relationships with semiconductor facilities and custom process development