Post-CMP Cleaners
Electronics Ultra-Pure
Electronics Chemical

Post-CMP Cleaners

Premium electronics grade Post-CMP cleaners manufactured to meet stringent semiconductor industry specifications for wafer cleaning and residue removal after CMP processes. Provides exceptional cleaning efficiency with ultra-high purity and consistent performance for advanced semiconductor manufacturing processes.

  • Electronics Grade Purity
  • Effective Residue Removal
  • Surface Damage-Free Cleaning
  • Low Contamination Levels
  • Consistent Cleaning Performance
  • Advanced Semiconductor Processing
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Technical Specifications

pH Range: 2.0-12.0
Metal Impurities: ≤ 0.1 ppm total
Particle Count: ≤ 20 per mL
Conductivity: ≤ 5 μS/cm
Cleaning Efficiency: ≥99.5%
Residue Level: ≤ 0.01 mg/cm²
Etch Rate: < 0.1 Å/min
Temperature Range: 20-70°C
Shelf Life: 12 months at RT
Packaging: 1L, 4L, 20L containers

Applications

Post-CMP Cleaning
Wafer Cleaning
Particle Removal
Residue Removal
Metal Removal
Substrate Cleaning
Process Equipment
Chemical Polishing
Surface Preparation
Quality Control
Electronic Manufacturing
R&D Applications

Industry-Specific Grades

DRAVYOM offers specialized post-CMP cleaner grades tailored for specific electronic applications, ensuring optimal performance and regulatory compliance across diverse manufacturing requirements.

Semiconductor Grade
Cleaning Efficiency: ≥99.5% Metal Impurities: ≤ 0.01 ppm Particle Count: ≤ 5 per mL Application: IC manufacturing
CMP Grade
Cleaning Efficiency: ≥99.0% Residue Removal: Excellent Selectivity: High Application: CMP processes
Metal Removal Grade
Cleaning Efficiency: ≥98.5% Metal Complexing: Strong Corrosion: Minimal Application: Metal cleaning
Research Grade
Cleaning Efficiency: ≥98.0% Batch Consistency: ±1% Documentation: Complete Application: R&D work

Quality Standards

DRAVYOM's Post-CMP Cleaners are manufactured under stringent quality control protocols, meeting international electronics standards including SEMI, ASTM, and ISO specifications. Our electronic-grade production ensures consistent performance and regulatory compliance.

ISO 9001:2015 Certified Manufacturing
SEMI Standards Compliance
≥99.5% Cleaning Efficiency
Advanced Quality Testing
Ultra-Low Metal Impurities
Batch-to-Batch Consistency
Traceable Certificate of Analysis
Controlled Environment Storage

Advanced Chemical Properties & Performance

Electronic Grade Post-CMP Cleaners exhibit exceptional chemical properties essential for precision post-planarization cleaning applications. The ultra-pure composition and controlled chemistry ensure reliable performance in demanding residue removal and surface preparation processes.

Chemical Properties
Active Components: Chelating agents, surfactants
pH Range: 2.0-12.0 (formulation dependent)
Conductivity: < 500 μS/cm
Chelation Capacity: High metal binding
Physical Properties
Appearance: Clear to slightly colored
Density (20°C): 1.0-1.2 g/mL
Viscosity: Low viscosity fluid
Surface Tension: Optimized wetting
Cleaning Properties
Particle Removal: ≥ 99.5% efficiency
Metal Removal: Effective chelation
Organic Residue: Complete removal
Selectivity: Material compatible
Purity Specifications
Total Impurities: ≤ 100 ppm
Metal Impurities: ≤ 1 ppm total
Particles (>0.1μm): ≤ 100/mL
Anions: ≤ 10 ppm each
Process Properties
Cleaning Time: 1-5 minutes optimal
Temperature Range: 20-80°C operation
Rinse Compatibility: DI water compatible
Material Compatibility: CMOS compatible

Performance Characteristics

Detailed performance metrics demonstrate Electronic Grade Post-CMP Cleaners superiority in semiconductor cleaning applications with exceptional particle removal efficiency, controlled material selectivity, and reliable performance for critical device fabrication processes.

High Cleaning Efficiency

≥ 99.5% particle removal

Superior cleaning
Ultra-Low Metals

≤ 1 ppm total

Contamination-free
Material Selectivity

CMOS compatible

Safe for all layers
Low Particles

≤ 100/mL >0.1μm

Ultra-clean solution
Fast Cleaning

1-5 minutes optimal

Efficient process
Process Ready

CMP line compatible

Production qualified

Safety Information

Chemical cleaning solutions that may cause skin and eye irritation. Contains chelating agents and surfactants that require appropriate handling procedures. Handle with chemical-resistant gloves and safety equipment. Ensure adequate ventilation and emergency response capabilities.

Irritant
Eye/Skin Hazard
Chemical Solution

Storage & Handling

Store in original containers in a cool, well-ventilated area away from incompatible materials. Use only with chemical-resistant equipment and implement appropriate spill control measures. Ensure compatibility with process equipment materials and maintain proper filtration systems.

Cool storage (5-25°C)
Filtered environment
Chemical compatibility
Adequate ventilation

Chemical Mechanisms & Reaction Pathways

Hydrochloric acid exhibits strong acid properties through complete ionization in aqueous solution, enabling precise analytical applications with predictable reaction pathways and quantitative stoichiometry.

Acid-Base Reactions

Complete ionization: HCl → H⁺ + Cl⁻ in aqueous solution

Quantitative proton donation for titrations
Metal Dissolution

Reactive dissolution of metals and metal oxides for analysis

Essential for sample preparation procedures
Complex Formation

Chloride complexation withmetal ions for separation

Enables selective analytical extractions
Redox Reactions

Participates in oxidation-reduction analytical procedures

Controlled redox environment for analysis

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures global analytical laboratory access with complete documentation packages supporting international standards and analytical method validations.

ACS Specifications

American Chemical Society analytical reagent standards compliance

ISO 6353 Standard

International standard for reagent specifications and testing

USP Grade Available

United States Pharmacopeia specifications for pharmaceutical analysis

REACH Registration

European Union chemical regulation compliance

Method Validation

Supported analytical method validation documentation

SDS Documentation

Multi-language Safety Data Sheets (16 sections, GHS compliant)

Technical Support & Value-Added Services

DRAVYOM's analytical chemistry team provides comprehensive method support, troubleshooting assistance, and analytical services to optimize AR Grade HCl performance in your specific analytical applications.

Method Development
  • Analytical method optimization support
  • Sample preparation guidance
  • Precision and accuracy validation
  • Custom analytical procedures
Analytical Services
  • Certificate of Analysis verification
  • Custom purity analysis
  • Trace metal contamination testing
  • Method validation support
Technical Support
  • Analytical troubleshooting consultation
  • Storage and handling guidance
  • Safety training and protocols
  • Laboratory best practices
Supply Solutions
  • Consistent batch scheduling
  • Emergency supply arrangements
  • Custom packaging options
  • Global distribution network

Environmental Impact & Sustainability

Our AR Grade HCl production emphasizes environmental responsibility through sustainable manufacturing practices, waste minimization, and comprehensive environmental impact management for analytical laboratory operations.

Waste Minimization

Optimized production with minimal waste generation

Water Treatment

Advanced wastewater treatment and recycling systems

Clean Production

Energy-efficient synthesis with emission controls

Safe Disposal

Comprehensive guidance for laboratory waste management

ISO 14001

Environmental management system certified production

Container Recycling

Glass container return and recycling programs

Manufacturing Excellence & Quality Control

DRAVYOM's state-of-the-art analytical reagent manufacturing facility employs advanced purification technology and continuous monitoring systems to ensure consistent AR Grade HCl quality and performance across all production batches.

Production Process

Advanced distillation and purification in controlled clean-room environment

Multi-stage purification for analytical grade quality
Quality Testing

25-point analytical testing protocol including metals, organics, and trace impurities

ICP-MS verification and spectroscopic analysis
Quality Systems

ISO 9001:2015 quality management with analytical laboratory accreditation

Continuous improvement and method validation
Packaging Control

Amber glass containers with inert atmosphere packaging

Light protection and contamination prevention

Market Applications & Performance Data

Comprehensive analytical laboratory data demonstrating AR Grade HCl effectiveness across diverse applications with quantified performance metrics and analytical method validations.

Analytical Laboratories
Precision: ±0.02% RSD in titrations Detection Limits: Sub-ppb metal analysis Method Validation: 100% ACS compliance
Research Institutions
Publication Support: 500+ cited methods Reproducibility: >99% inter-lab agreement Innovation: Custom grade development
Quality Control Labs
Reliability: 99.9% batch consistency Audit Success: 100% regulatory compliance Efficiency: 30% faster analysis times

DRAVYOM Competitive Advantages

Superior Purity

Consistently exceeds ACS specifications with ultra-low impurities and exceptional analytical performance

Reliable Supply

Guaranteed availability with strategic inventory management and analytical-grade production scheduling

Analytical Expertise

Dedicated analytical chemistry team provides method development and troubleshooting support

Quality Assurance

Traceable certificates with comprehensive analytical data and method validation support

Global Standards

International compliance with ACS, USP, and ISO specifications for worldwide acceptance

Partnership Approach

Collaborative relationships with analytical laboratories and custom grade development services