Nitrogen Trifluoride
Electronics Ultra-Pure
Electronics Chemical

Nitrogen Trifluoride (NF3)

Premium electronics grade Nitrogen Trifluoride manufactured to meet stringent semiconductor industry specifications for cleaning and etching applications. Provides exceptional cleaning efficiency with ultra-high purity and consistent performance for advanced semiconductor manufacturing processes.

  • Electronics Grade Purity
  • Chamber Cleaning Applications
  • Precision Etching Gas
  • Ultra-Low Contamination
  • Consistent Gas Quality
  • Advanced Semiconductor Processing
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Technical Specifications

Purity: ≥99.9%
Moisture Content: ≤ 5 ppm
Oxygen Content: ≤ 10 ppm
Nitrogen Content: ≤ 20 ppm
Carbon Dioxide: ≤ 5 ppm
Metal Impurities: ≤ 0.1 ppm total
Particulate Matter: ≤ 0.5 ppm
Delivery Pressure: 15-30 psig
Shelf Life: 12 months at RT
Packaging: Specialty gas cylinders

Applications

Chamber Cleaning
CVD Equipment Cleaning
Etching Processes
Surface Cleaning
Process Chamber Maintenance
Semiconductor Manufacturing
Wafer Cleaning
Optical Component Cleaning
Plasma Etching
Quality Control
R&D Applications
Process Development

Industry-Specific Grades

DRAVYOM offers specialized nitrogen trifluoride grades tailored for specific electronic applications, ensuring optimal performance and regulatory compliance across diverse manufacturing requirements.

Semiconductor Grade
Purity: ≥99.9% Moisture: ≤ 1 ppm Metal Impurities: ≤ 0.01 ppm Application: IC manufacturing
Chamber Cleaning Grade
Purity: ≥99.5% Etch Rate: High Selectivity: Excellent Application: CVD chamber cleaning
Etching Grade
Purity: ≥99.0% Uniformity: High Stability: Excellent Application: Plasma etching
Research Grade
Purity: ≥98.0% Batch Consistency: ±0.5% Documentation: Complete Application: R&D work

Quality Standards

DRAVYOM's Nitrogen Trifluoride is manufactured under stringent quality control protocols, meeting international electronics standards including SEMI, ASTM, and ISO specifications. Our electronic-grade production ensures consistent performance and regulatory compliance.

ISO 9001:2015 Certified Manufacturing
SEMI Standards Compliance
≥99.9% Purity Guarantee
Advanced Quality Testing
Ultra-Low Impurity Levels
Batch-to-Batch Consistency
Traceable Certificate of Analysis
Specialty Gas Handling

Advanced Chemical Properties & Performance

Electronic Grade Nitrogen Trifluoride exhibits exceptional chemical properties essential for precision semiconductor plasma processes. The ultra-pure composition and controlled chemistry ensure reliable performance in demanding chamber cleaning and plasma etching applications.

Chemical Properties
Molecular Formula: NF₃
Molecular Weight: 71.00 g/mol
Density (liquid): 1.885 g/mL (-129°C)
Bond Strength: N-F: 283 kJ/mol
Physical Properties
Boiling Point: -129.1°C
Melting Point: -206.8°C
Critical Temperature: -39.0°C
Critical Pressure: 44.6 bar
Plasma Properties
Dissociation Energy: High F radical yield
Etch Rate (SiO₂): High selectivity
Chamber Cleaning: Efficient residue removal
Fluorine Delivery: Controlled F atom flux
Purity Specifications
Purity: ≥ 99.9%
Moisture (H₂O): ≤ 3 ppm
Oxygen (O₂): ≤ 5 ppm
Carbon Compounds: ≤ 1 ppm total
Stability Properties
Chemical Stability: Stable under normal conditions
Thermal Stability: Stable to 500°C
Storage Stability: Excellent long-term
Reactivity: Inert under ambient conditions

Performance Characteristics

Detailed performance metrics demonstrate Electronic Grade Nitrogen Trifluoride superiority in semiconductor applications with exceptional purity, excellent plasma performance, and reliable chamber cleaning for advanced manufacturing processes.

High Purity

≥ 99.9% pure

Electronic grade quality
Ultra-Low Moisture

≤ 3 ppm water

Dry gas performance
Efficient Cleaning

Superior chamber cleaning

Residue removal
High F Yield

Excellent dissociation

Fluorine radical source
Stable Gas

Thermally stable to 500°C

Process reliability
Semiconductor Ready

SEMI spec compliant

Fab-grade quality

Safety Information

Strong oxidizing gas that can react violently with combustible materials. May cause severe burns and respiratory damage. Under certain conditions can form toxic hydrogen fluoride. Handle with appropriate protective equipment and ensure adequate ventilation. Use only compatible gas handling equipment.

Strong Oxidizer
Pressurized Gas
Respiratory Hazard

Storage & Handling

Store in original cylinders in a cool, well-ventilated area away from combustible materials. Use only equipment designed for fluorinated gases. Ensure proper gas detection systems and emergency response procedures are in place. Maintain cylinder temperature control.

Temperature controlled storage
Excellent ventilation
Away from combustibles
Gas detection systems

Chemical Mechanisms & Reaction Pathways

Hydrochloric acid exhibits strong acid properties through complete ionization in aqueous solution, enabling precise analytical applications with predictable reaction pathways and quantitative stoichiometry.

Acid-Base Reactions

Complete ionization: HCl → H⁺ + Cl⁻ in aqueous solution

Quantitative proton donation for titrations
Metal Dissolution

Reactive dissolution of metals and metal oxides for analysis

Essential for sample preparation procedures
Complex Formation

Chloride complexation withmetal ions for separation

Enables selective analytical extractions
Redox Reactions

Participates in oxidation-reduction analytical procedures

Controlled redox environment for analysis

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures global analytical laboratory access with complete documentation packages supporting international standards and analytical method validations.

ACS Specifications

American Chemical Society analytical reagent standards compliance

ISO 6353 Standard

International standard for reagent specifications and testing

USP Grade Available

United States Pharmacopeia specifications for pharmaceutical analysis

REACH Registration

European Union chemical regulation compliance

Method Validation

Supported analytical method validation documentation

SDS Documentation

Multi-language Safety Data Sheets (16 sections, GHS compliant)

Technical Support & Value-Added Services

DRAVYOM's analytical chemistry team provides comprehensive method support, troubleshooting assistance, and analytical services to optimize AR Grade HCl performance in your specific analytical applications.

Method Development
  • Analytical method optimization support
  • Sample preparation guidance
  • Precision and accuracy validation
  • Custom analytical procedures
Analytical Services
  • Certificate of Analysis verification
  • Custom purity analysis
  • Trace metal contamination testing
  • Method validation support
Technical Support
  • Analytical troubleshooting consultation
  • Storage and handling guidance
  • Safety training and protocols
  • Laboratory best practices
Supply Solutions
  • Consistent batch scheduling
  • Emergency supply arrangements
  • Custom packaging options
  • Global distribution network

Environmental Impact & Sustainability

Our AR Grade HCl production emphasizes environmental responsibility through sustainable manufacturing practices, waste minimization, and comprehensive environmental impact management for analytical laboratory operations.

Waste Minimization

Optimized production with minimal waste generation

Water Treatment

Advanced wastewater treatment and recycling systems

Clean Production

Energy-efficient synthesis with emission controls

Safe Disposal

Comprehensive guidance for laboratory waste management

ISO 14001

Environmental management system certified production

Container Recycling

Glass container return and recycling programs

Manufacturing Excellence & Quality Control

DRAVYOM's state-of-the-art analytical reagent manufacturing facility employs advanced purification technology and continuous monitoring systems to ensure consistent AR Grade HCl quality and performance across all production batches.

Production Process

Advanced distillation and purification in controlled clean-room environment

Multi-stage purification for analytical grade quality
Quality Testing

25-point analytical testing protocol including metals, organics, and trace impurities

ICP-MS verification and spectroscopic analysis
Quality Systems

ISO 9001:2015 quality management with analytical laboratory accreditation

Continuous improvement and method validation
Packaging Control

Amber glass containers with inert atmosphere packaging

Light protection and contamination prevention

Market Applications & Performance Data

Comprehensive analytical laboratory data demonstrating AR Grade HCl effectiveness across diverse applications with quantified performance metrics and analytical method validations.

Analytical Laboratories
Precision: ±0.02% RSD in titrations Detection Limits: Sub-ppb metal analysis Method Validation: 100% ACS compliance
Research Institutions
Publication Support: 500+ cited methods Reproducibility: >99% inter-lab agreement Innovation: Custom grade development
Quality Control Labs
Reliability: 99.9% batch consistency Audit Success: 100% regulatory compliance Efficiency: 30% faster analysis times

DRAVYOM Competitive Advantages

Superior Purity

Consistently exceeds ACS specifications with ultra-low impurities and exceptional analytical performance

Reliable Supply

Guaranteed availability with strategic inventory management and analytical-grade production scheduling

Analytical Expertise

Dedicated analytical chemistry team provides method development and troubleshooting support

Quality Assurance

Traceable certificates with comprehensive analytical data and method validation support

Global Standards

International compliance with ACS, USP, and ISO specifications for worldwide acceptance

Partnership Approach

Collaborative relationships with analytical laboratories and custom grade development services