Nitric Acid (Electronic Grade)
Electronic Premium
Electronic Grade Chemical

Nitric Acid (Electronic Grade)

Ultra-pure electronic grade Nitric Acid manufactured to meet stringent semiconductor industry specifications. Our electronic grade HNO₃ provides exceptional purity with ultra-low metal contamination for critical semiconductor processing and advanced electronics manufacturing.

  • Electronic Grade Purity
  • Ultra-Low Metal Contamination
  • Superior Etching Performance
  • Semiconductor Compatible
  • Precise Concentration Control
  • Consistent Quality

Electronics Excellence Demands Ultra-Pure Chemicals

Get electronic grade Nitric Acid for semiconductor manufacturing, explore custom concentrations, or discuss process optimization with our electronics specialists.

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Technical Specifications

Concentration: 68-70% (w/w)
Purity: ≥99.999%
Metal Impurities: ≤ 0.01 ppm total
Particle Count: ≤ 5 per mL
Chloride Content: ≤ 0.1 ppm
Conductivity: ≤ 0.5 μS/cm
Residue on Evaporation: ≤ 0.001%
pH: < 0.1
Shelf Life: 24 months at RT
Packaging: 1L, 4L, 20L containers

Applications

Semiconductor Etching
Metal Etching
Wafer Cleaning
Oxidation Processes
Chemical Synthesis
PCB Manufacturing
Analytical Applications
Process Chemistry
Precision Cleaning
Quality Control
Electronic Manufacturing
Research Applications

Industry-Specific Grades

DRAVYOM offers specialized HNO₃ grades tailored for specific electronic applications, ensuring optimal performance and regulatory compliance across diverse manufacturing requirements.

Semiconductor Grade
Purity: ≥99.999% Metal Impurities: ≤ 0.001 ppm Particle Count: ≤ 1 per mL Application: IC manufacturing
Etching Grade
Purity: ≥99.99% Etch Rate: Controlled Selectivity: High Application: Metal etching
Cleaning Grade
Purity: ≥99.9% Residue: ≤ 0.0001% Conductivity: ≤ 0.1 μS/cm Application: Wafer cleaning
Analytical Grade
Purity: ≥99.5% Batch Consistency: ±0.1% Documentation: Complete Application: Analysis

Quality Standards

DRAVYOM's Electronic Grade HNO₃ is manufactured under stringent quality control protocols, meeting international electronics standards including SEMI, ASTM, and ISO specifications. Our electronic-grade production ensures consistent performance and regulatory compliance.

ISO 9001:2015 Certified Manufacturing
SEMI Standards Compliance
≥99.999% Purity Guarantee
Advanced Quality Testing
Ultra-Low Impurity Levels
Batch-to-Batch Consistency
Traceable Certificate of Analysis
Controlled Environment Storage

Advanced Chemical Properties & Performance

Electronic Grade Nitric Acid exhibits exceptional chemical properties essential for precision electronics applications. The ultra-pure composition and controlled chemistry ensure reliable performance in demanding semiconductor cleaning, etching, and analytical applications.

Chemical Properties
Molecular Formula: HNO₃
Molecular Weight: 63.01 g/mol
Density (68% sol): 1.40-1.42 g/mL
Concentration Range: 68-70% w/w
Physical Properties
Boiling Point: 83°C (68% solution)
Freezing Point: -41.6°C (68% solution)
Vapor Pressure (20°C): 48 mmHg
pH: < 1 (highly acidic)
Oxidizing Properties
Oxidation Potential: Strong oxidizer
Etch Rate (Si): Variable with dilution
Metal Solubility: Excellent for most metals
Organic Oxidation: Complete mineralization
Purity Specifications
Purity: ≥ 99.999% (5N)
Metal Impurities: ≤ 0.01 ppm total
Chloride (Cl⁻): ≤ 0.05 ppm
Sulfate (SO₄²⁻): ≤ 0.1 ppm
Electrical Properties
Conductivity: ≤ 0.1 μS/cm (diluted)
Resistivity: ≥ 10 MΩ·cm
Ion Content: Ultra-low levels
Residue on Evaporation: ≤ 0.0001%

Performance Characteristics

Detailed performance metrics demonstrate Electronic Grade Nitric Acid superiority in electronics applications with exceptional purity, powerful oxidizing capability, and consistent performance for critical semiconductor and analytical processes.

Ultra-High Purity

≥ 99.999% (5N)

Electronic grade quality
Ultra-Low Metals

≤ 0.01 ppm total

Contamination-free
Low Conductivity

≤ 0.1 μS/cm

Electronic applications
Strong Oxidizer

Powerful cleaning action

Complete removal
Analytical Grade

≤ 0.0001% residue

Clean evaporation
Semiconductor Ready

SEMI compliant

Fab-grade quality

Safety Information

Extremely corrosive and strong oxidizing agent that can cause severe burns and respiratory damage. Reacts violently with organic materials and metals. Generates toxic nitrogen oxide vapors. Handle with extreme caution using appropriate protective equipment and ensure excellent ventilation with emergency response capabilities.

Extremely Corrosive
Strong Oxidizer
Toxic Vapors

Storage & Handling

Store in original containers in a cool, well-ventilated area away from organic materials and incompatible substances. Use only corrosion-resistant equipment. Maintain strict safety protocols and ensure emergency equipment including eyewash stations and spill control materials are immediately available.

Cool storage (15-25°C)
Excellent ventilation
Acid-resistant materials
Emergency response ready

Chemical Mechanisms & Reaction Pathways

Hydrochloric acid exhibits strong acid properties through complete ionization in aqueous solution, enabling precise analytical applications with predictable reaction pathways and quantitative stoichiometry.

Acid-Base Reactions

Complete ionization: HCl → H⁺ + Cl⁻ in aqueous solution

Quantitative proton donation for titrations
Metal Dissolution

Reactive dissolution of metals and metal oxides for analysis

Essential for sample preparation procedures
Complex Formation

Chloride complexation withmetal ions for separation

Enables selective analytical extractions
Redox Reactions

Participates in oxidation-reduction analytical procedures

Controlled redox environment for analysis

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures global analytical laboratory access with complete documentation packages supporting international standards and analytical method validations.

ACS Specifications

American Chemical Society analytical reagent standards compliance

ISO 6353 Standard

International standard for reagent specifications and testing

USP Grade Available

United States Pharmacopeia specifications for pharmaceutical analysis

REACH Registration

European Union chemical regulation compliance

Method Validation

Supported analytical method validation documentation

SDS Documentation

Multi-language Safety Data Sheets (16 sections, GHS compliant)

Technical Support & Value-Added Services

DRAVYOM's analytical chemistry team provides comprehensive method support, troubleshooting assistance, and analytical services to optimize AR Grade HCl performance in your specific analytical applications.

Method Development
  • Analytical method optimization support
  • Sample preparation guidance
  • Precision and accuracy validation
  • Custom analytical procedures
Analytical Services
  • Certificate of Analysis verification
  • Custom purity analysis
  • Trace metal contamination testing
  • Method validation support
Technical Support
  • Analytical troubleshooting consultation
  • Storage and handling guidance
  • Safety training and protocols
  • Laboratory best practices
Supply Solutions
  • Consistent batch scheduling
  • Emergency supply arrangements
  • Custom packaging options
  • Global distribution network

Environmental Impact & Sustainability

Our AR Grade HCl production emphasizes environmental responsibility through sustainable manufacturing practices, waste minimization, and comprehensive environmental impact management for analytical laboratory operations.

Waste Minimization

Optimized production with minimal waste generation

Water Treatment

Advanced wastewater treatment and recycling systems

Clean Production

Energy-efficient synthesis with emission controls

Safe Disposal

Comprehensive guidance for laboratory waste management

ISO 14001

Environmental management system certified production

Container Recycling

Glass container return and recycling programs

Manufacturing Excellence & Quality Control

DRAVYOM's state-of-the-art analytical reagent manufacturing facility employs advanced purification technology and continuous monitoring systems to ensure consistent AR Grade HCl quality and performance across all production batches.

Production Process

Advanced distillation and purification in controlled clean-room environment

Multi-stage purification for analytical grade quality
Quality Testing

25-point analytical testing protocol including metals, organics, and trace impurities

ICP-MS verification and spectroscopic analysis
Quality Systems

ISO 9001:2015 quality management with analytical laboratory accreditation

Continuous improvement and method validation
Packaging Control

Amber glass containers with inert atmosphere packaging

Light protection and contamination prevention

Market Applications & Performance Data

Comprehensive analytical laboratory data demonstrating AR Grade HCl effectiveness across diverse applications with quantified performance metrics and analytical method validations.

Analytical Laboratories
Precision: ±0.02% RSD in titrations Detection Limits: Sub-ppb metal analysis Method Validation: 100% ACS compliance
Research Institutions
Publication Support: 500+ cited methods Reproducibility: >99% inter-lab agreement Innovation: Custom grade development
Quality Control Labs
Reliability: 99.9% batch consistency Audit Success: 100% regulatory compliance Efficiency: 30% faster analysis times

DRAVYOM Competitive Advantages

Superior Purity

Consistently exceeds ACS specifications with ultra-low impurities and exceptional analytical performance

Reliable Supply

Guaranteed availability with strategic inventory management and analytical-grade production scheduling

Analytical Expertise

Dedicated analytical chemistry team provides method development and troubleshooting support

Quality Assurance

Traceable certificates with comprehensive analytical data and method validation support

Global Standards

International compliance with ACS, USP, and ISO specifications for worldwide acceptance

Partnership Approach

Collaborative relationships with analytical laboratories and custom grade development services