Indium Phosphide (InP) Etchants
Electronic Premium
Electronic Grade Chemical

Indium Phosphide (InP) Etchants

Ultra-pure electronic grade Indium Phosphide Etchants manufactured to meet stringent semiconductor industry specifications. Our InP etchants provide exceptional selectivity and precision for compound semiconductor device fabrication and advanced electronics manufacturing.

  • Electronic Grade Purity
  • Superior Etching Selectivity
  • Precise Pattern Definition
  • Compound Semiconductor Compatible
  • Ultra-Low Contamination
  • Advanced Device Performance
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Electronics Excellence Demands Ultra-Pure Chemicals

Get electronic grade Indium Phosphide Etchants for semiconductor manufacturing, explore custom formulations, or discuss process optimization with our electronics specialists.

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Technical Specifications

Target Material: Indium Phosphide (InP)
Etch Rate: 50-500 nm/min
Selectivity: >100:1 (InP:SiO₂)
Operating Temperature: 20-50°C
pH Range: 1.0-3.0
Surface Roughness: ≤ 2 nm RMS
Metal Impurities: ≤ 1 ppm total
Particle Count: ≤ 50 per mL
Shelf Life: 12 months at 25°C
Packaging: 500mL, 1L, 5L containers

Applications

Semiconductor Device Etching
Optoelectronic Devices
High-Frequency Applications
Photonic Devices
Mesa Isolation
Quantum Well Structures
Precision Patterning
Optical Components
High-Performance Electronics
Surface Preparation
Research Applications
Quality Control

Industry-Specific Grades

DRAVYOM offers specialized InP etchants tailored for specific applications, ensuring optimal performance and regulatory compliance across diverse manufacturing requirements.

Semiconductor Grade
Purity: ≥99.9% Etch Rate: 100-300 nm/min Metal Impurities: ≤ 0.1 ppm Application: Device fabrication
Photonic Grade
Purity: ≥99.8% Surface Roughness: ≤ 1 nm Selectivity: >200:1 Application: Optical devices
High-Frequency Grade
Purity: ≥99.7% Etch Rate: 200-500 nm/min Uniformity: ±2% Application: RF components
Research Grade
Purity: ≥99.5% Batch Consistency: ±0.5% Documentation: Complete Application: R&D work

Quality Standards

DRAVYOM's InP Etchants are manufactured under stringent quality control protocols, meeting international electronics standards including SEMI, ASTM, and ISO specifications. Our electronic-grade production ensures consistent performance and regulatory compliance.

ISO 9001:2015 Certified Manufacturing
SEMI Standards Compliance
Controlled Etch Rate
Advanced Quality Testing
Ultra-Low Impurity Levels
Batch-to-Batch Consistency
Traceable Certificate of Analysis
Temperature-Controlled Storage

Advanced Chemical Properties & Performance

Electronic Grade Indium Phosphide Etchants exhibit exceptional chemical properties essential for precision compound semiconductor processing applications. The ultra-pure composition and controlled chemistry ensure reliable performance in demanding InP device manufacturing processes.

Etching Properties
InP Etch Rate: 10-200 nm/min
Selectivity: InP:InGaAs > 20:1
Uniformity: ±3% across wafer
Surface Quality: < 1 nm RMS roughness
Process Conditions
Temperature Range: 20-50°C
pH Range: 1.0-3.0 (acidic)
Agitation: Gentle stirring required
Bath Life: 6-12 hours active
Chemical Composition
Primary Components: HCl:HNO₃:H₂O
Typical Ratio: 3:1:50 (aqua regia based)
Alternative: H₂SO₄:H₂O₂:H₂O
Oxidizing Agent: Controlled concentration
Purity Specifications
Metal Impurities: ≤ 10 ppb total
Particle Count: ≤ 50 (>0.5µm)/mL
Organic Impurities: ≤ 5 ppb TOC
Halide Content: Controlled levels
Stability Properties
Shelf Life: 1 month (mixed)
Storage Temperature: 15-25°C
Light Sensitivity: Store in dark containers
Activity Loss: < 10% per week

Performance Characteristics

Detailed performance metrics demonstrate Electronic Grade InP Etchant superiority in compound semiconductor applications with exceptional etch control, selectivity, and surface quality for optoelectronic device fabrication.

High Selectivity

InP:InGaAs > 20:1

Material discrimination
Controlled Rate

10-200 nm/min range

Process flexibility
Surface Quality

< 1 nm RMS roughness

Smooth etch finish
Uniformity

±3% across wafer

Consistent processing
Process Window

20-50°C operation

Temperature stable
Optoelectronic Ready

Device-quality etching

Photonic applications

Safety Information

Contains strong acids including aqua regia (HCl + HNO₃) or sulfuric acid mixtures that are extremely corrosive and can cause severe burns. Generates toxic nitrogen oxide vapors. Handle with extreme caution using appropriate protective equipment and fume hood ventilation.

Highly Toxic
Corrosive
Toxic Vapors

Storage & Handling

Store components separately in original containers in a cool, well-ventilated area away from organic materials. Mix fresh solutions as needed. Use only compatible materials and ensure emergency equipment including eyewash stations and spill control materials are readily available.

Cool storage (15-25°C)
Excellent ventilation
Separate component storage
Emergency equipment ready

Chemical Mechanisms & Reaction Pathways

InP etchants utilize controlled acid chemistry and oxidation-reduction mechanisms to provide selective compound semiconductor etching with precise rate control and exceptional anisotropy for optoelectronic device fabrication.

Oxidative Dissolution

H₂O₂ oxidation followed by acid dissolution of oxides

Controlled compound semiconductor etching
Selective Chemistry

Preferential etching of InP versus other III-V materials

Material discrimination capability
Surface Passivation

Controlled surface termination for device quality

Low defect density interfaces
Anisotropic Control

Crystallographic orientation dependent etching

Precise feature definition

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures global semiconductor facility access with complete documentation packages supporting international compound semiconductor manufacturing standards and III-V processing qualifications.

SEMI Standards

Semiconductor Equipment and Materials International compliance

III-V Processing Specifications

Compound semiconductor etching and processing standards

Photonic Device Standards

Optoelectronic device fabrication and etching specifications

Transport Regulations

Hazardous material transport and shipping compliance

Process Validation

Supported InP processing qualification documentation

SDS Documentation

Multi-language Safety Data Sheets (16 sections, GHS compliant)

Technical Support & Value-Added Services

DRAVYOM's compound semiconductor team provides comprehensive III-V processing support, etch development assistance, and analytical services to maximize InP etchant performance in your specific optoelectronic applications.

Process Development
  • InP etch process optimization support
  • Selectivity enhancement guidance
  • Etch rate and anisotropy optimization
  • Custom compound semiconductor etchant development
Analytical Services
  • Etch rate characterization and monitoring
  • Surface morphology analysis
  • Selectivity testing and validation
  • III-V processing qualification support
Technical Support
  • Compound semiconductor etching consultation
  • Equipment compatibility guidance
  • Safety training and protocols
  • Optoelectronic device fabrication best practices
Supply Solutions
  • Safe etchant delivery and handling systems
  • Emergency InP etchant supply arrangements
  • Custom concentration preparation
  • Global compound semiconductor network

Environmental Impact & Sustainability

Our InP etchant production emphasizes environmental responsibility through sustainable manufacturing practices, acid recovery, and comprehensive environmental impact management for compound semiconductor operations.

Acid Recovery

Advanced acid recovery and regeneration systems

Neutralization Systems

Comprehensive acid neutralization and treatment systems

Clean Production

Energy-efficient manufacturing with emission controls

Safe Disposal

Comprehensive guidance for etchant waste management

ISO 14001

Environmental management system certified production

Container Recycling

Acid-resistant container return and recycling programs

Manufacturing Excellence & Quality Control

DRAVYOM's state-of-the-art etchant manufacturing facility employs advanced formulation technology and continuous monitoring systems to ensure consistent InP etchant quality and performance across all production batches.

Production Process

Advanced formulation and blending in controlled clean environment

Multi-stage processing for device grade quality
Quality Testing

15-point analytical testing protocol including etch rate and selectivity

III-V wafer testing and performance validation
Quality Systems

ISO 9001:2015 quality management with compound semiconductor accreditation

Continuous improvement and process validation
Packaging Control

Acid-resistant containers with specialized safety packaging

Stability preservation and contamination prevention

Market Applications & Performance Data

Comprehensive optoelectronic manufacturing data demonstrating InP etchant effectiveness across diverse device applications with quantified performance metrics and process validations.

Optoelectronic Devices
Etch Rate: 10-200 nm/min controlled Selectivity: >100:1 vs AlInAs Surface Quality: <1 nm RMS roughness
RF/Microwave Devices
Uniformity: ±3% across wafer Anisotropy: >95% vertical walls Temperature Range: 20-50°C stable
Photonic Applications
Process Control: ±5% etch rate Throughput: 40% faster processing Yield: 99%+ device quality

DRAVYOM Competitive Advantages

Superior Selectivity

Consistently exceeds industry specifications with optimized InP etchant formulations and exceptional device quality

Reliable Supply

Guaranteed availability with specialized logistics and compound semiconductor etchant production scheduling

III-V Expertise

Dedicated compound semiconductor team provides process development and device fabrication support

Quality Assurance

Traceable certificates with comprehensive analytical data and optoelectronic validation support

Global Standards

International compliance with SEMI and photonic device specifications for worldwide acceptance

Partnership Approach

Collaborative relationships with device manufacturers and custom etchant development services