HMDS
Electronics Ultra-Pure
Electronics Chemical

Hexamethyldisilazane (HMDS)

Premium electronics grade HMDS manufactured to meet stringent semiconductor industry specifications for adhesion promotion and surface treatment. Provides exceptional primer performance with ultra-high purity and consistent quality for advanced photoresist and coating applications.

  • Electronics Grade Purity
  • Superior Adhesion Promotion
  • Photoresist Primer Applications
  • Surface Treatment Excellence
  • Consistent Chemical Quality
  • Advanced Semiconductor Processing
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Technical Specifications

Chemical Formula: [(CH₃)₃Si]₂NH
CAS Number: 999-97-3
Molecular Weight: 161.39 g/mol
Purity: ≥99.9% (Electronic Grade)
Physical State: Clear, colorless liquid
Density (20°C): 0.774 g/cm³
Boiling Point: 125.5°C
Flash Point: 15°C
Vapor Pressure (20°C): 13.3 mbar
Water Content: ≤ 10 ppm
Metal Impurities: ≤ 1 ppm total
Packaging: 100mL, 500mL, 1L, 4L containers

Applications

Photoresist Adhesion Promoter
Silicon Surface Priming
Hydrophobic Surface Treatment
Semiconductor Processing
MEMS Fabrication
Optical Device Manufacturing
Precision Coatings
Chemical Vapor Deposition
Surface Functionalization
Thin Film Applications
Electronic Component Prep
Advanced Materials Processing

Industry-Specific Grades

DRAVYOM offers specialized HMDS grades tailored for specific electronic applications, ensuring optimal performance and regulatory compliance across diverse manufacturing requirements.

Semiconductor Grade
Purity: ≥99.99% Water Content: ≤ 5 ppm Metal Impurities: ≤ 0.1 ppm Application: Photoresist adhesion
MEMS Grade
Purity: ≥99.95% Particle Count: ≤ 10 per mL Organic Impurities: ≤ 10 ppm Application: MEMS device fabrication
Optical Grade
Purity: ≥99.9% Optical Clarity: High Residue: ≤ 0.001% Application: Optical device coatings
Research Grade
Purity: ≥99.5% Batch Consistency: ±0.1% Documentation: Complete Application: R&D applications

Quality Standards

DRAVYOM's HMDS is manufactured under stringent quality control protocols, meeting international electronics standards including SEMI, ASTM, and ISO specifications. Our electronic-grade production ensures consistent performance and regulatory compliance.

ISO 9001:2015 Certified Manufacturing
SEMI Standards Compliance
≥99.9% Purity Guarantee
Advanced Quality Testing
Ultra-Low Impurity Levels
Batch-to-Batch Consistency
Traceable Certificate of Analysis
Controlled Atmosphere Packaging

Advanced Chemical Properties & Performance

Electronic Grade Hexamethyldisilazane (HMDS) exhibits exceptional chemical properties essential for precision semiconductor adhesion promotion applications. The ultra-pure composition and optimized vapor delivery ensure reliable performance in demanding electronic manufacturing processes.

Adhesion Properties
Treatment Time: 30-300 seconds
Temperature Range: 120-150°C
Coverage: Monolayer formation
Contact Angle: 70-90° (hydrophobic)
Physical Properties
Boiling Point: 125.5°C
Density (20°C): 0.774 g/cm³
Vapor Pressure: 10 mmHg @20°C
Flash Point: -3°C
Chemical Properties
Molecular Formula: (CH₃)₃SiNHSi(CH₃)₃
Molecular Weight: 161.39 g/mol
Reactivity: Reacts with -OH groups
Stability: Moisture sensitive
Purity Specifications
Minimum Purity: ≥ 99.9%
Water Content: ≤ 10 ppm
Metal Impurities: ≤ 1 ppm total
Particle Count: ≤ 10 (>0.1µm)/mL
Process Performance
Delivery Method: Vapor phase
Consumption: 0.1-1.0 mL/wafer
Uniformity: ±2% across wafer
Shelf Life: 2 years (sealed)

Performance Characteristics

Detailed performance metrics demonstrate Electronic Grade HMDS superiority in semiconductor applications with exceptional adhesion promotion, uniform coverage, and photoresist compatibility.

Strong Adhesion

Excellent resist bonding

Superior adhesion promotion
Uniform Coverage

±2% across wafer

Consistent treatment
Hydrophobic Surface

70-90° contact angle

Water repellent
Fast Process

30-300 second treatment

Rapid processing
Ultra-Pure

≥ 99.9% purity

Minimal contamination
Stable Process

120-150°C operation

Controlled conditions

Safety Information

Highly flammable liquid with very low flash point. Vapors may cause respiratory irritation. Reacts with moisture forming ammonia. Handle with appropriate protective equipment including chemical-resistant gloves, safety goggles, and ensure adequate ventilation. Keep away from ignition sources.

Highly Flammable
Irritant
Vapor Hazard

Storage & Handling

Store in original containers in a cool, dry place away from moisture and ignition sources. Use appropriate vapor delivery systems with inert gas purging. Maintain strict moisture exclusion during handling and transfer operations.

Cool storage (< 25°C)
Moisture exclusion
Away from ignition sources
Inert gas atmosphere

Chemical Mechanisms & Reaction Pathways

HMDS exhibits controlled silanization chemistry and surface modification mechanisms to provide reliable hydrophobic treatment and adhesion promotion in semiconductor processing with predictable reaction kinetics and surface passivation.

Silanization Mechanism

Si-N bond hydrolysis and silanol formation for surface bonding

Controlled surface modification chemistry
Surface Passivation

Trimethylsilyl group attachment to hydroxyl sites

Effective hydrophobic surface treatment
Adhesion Promotion

Enhanced photoresist adhesion through surface energy control

Optimized for lithography applications
Vapor Phase Delivery

Controlled vapor transport for uniform surface coverage

Precise delivery for wafer processing

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures global semiconductor facility access with complete documentation packages supporting international electronics manufacturing standards and surface treatment process qualifications.

SEMI Standards

Semiconductor Equipment and Materials International compliance

Surface Treatment Specifications

Semiconductor surface modification and adhesion promotion standards

Silane Handling Standards

Specialty silane chemical handling and safety protocol specifications

Transport Regulations

Hazardous material transport and shipping compliance

Process Validation

Supported surface treatment process qualification documentation

SDS Documentation

Multi-language Safety Data Sheets (16 sections, GHS compliant)

Technical Support & Value-Added Services

DRAVYOM's semiconductor process team provides comprehensive surface treatment support, process optimization assistance, and analytical services to maximize HMDS performance in your specific lithography applications.

Process Development
  • Surface treatment process optimization support
  • Vapor delivery system guidance
  • Adhesion optimization and validation
  • Custom surface modification development
Analytical Services
  • Surface hydrophobicity analysis and monitoring
  • Contact angle measurement
  • Adhesion testing and validation
  • Surface treatment process qualification support
Technical Support
  • Surface treatment troubleshooting consultation
  • Equipment compatibility guidance
  • Safety training and protocols
  • Semiconductor surface chemistry best practices
Supply Solutions
  • Vapor delivery systems
  • Emergency HMDS supply arrangements
  • Custom packaging and handling
  • Global specialty chemical network

Environmental Impact & Sustainability

Our HMDS production emphasizes environmental responsibility through sustainable manufacturing practices, waste minimization, and comprehensive environmental impact management for semiconductor surface treatment operations.

Waste Minimization

Optimized synthesis with minimal waste generation

Vapor Recovery

Advanced vapor capture and recovery systems

Clean Production

Energy-efficient manufacturing with emission controls

Safe Disposal

Comprehensive guidance for silane waste management

ISO 14001

Environmental management system certified production

Container Recycling

Specialty chemical container return and recycling programs

Manufacturing Excellence & Quality Control

DRAVYOM's state-of-the-art silane manufacturing facility employs advanced purification technology and continuous monitoring systems to ensure consistent HMDS quality and performance across all production batches.

Production Process

Advanced distillation and purification in inert atmosphere environment

Multi-stage processing for electronic grade quality
Quality Testing

18-point analytical testing protocol including purity and moisture content

GC-MS analysis and performance validation
Quality Systems

ISO 9001:2015 quality management with silane specialty accreditation

Continuous improvement and process validation
Packaging Control

Moisture-barrier containers with inert atmosphere protection

Purity preservation and contamination prevention

Market Applications & Performance Data

Comprehensive semiconductor processing data demonstrating HMDS effectiveness across diverse surface treatment applications with quantified performance metrics and process validations.

Semiconductor Lithography
Contact Angle: >90° hydrophobic Coverage: >95% surface modification Uniformity: ±2% across wafer
Adhesion Promotion
Adhesion Improvement: 300% increase Process Time: 60 second treatment Temperature: 100-150°C optimal
MEMS Processing
Release Layer: <5nm thickness Throughput: 40% faster processing Yield: 99%+ treatment success

DRAVYOM Competitive Advantages

Superior Purity

Consistently exceeds semiconductor specifications with ultra-pure HMDS formulations and exceptional surface treatment performance

Reliable Supply

Guaranteed availability with specialized logistics and specialty silane production scheduling

Surface Chemistry Expertise

Dedicated surface treatment team provides process development and troubleshooting support

Quality Assurance

Traceable certificates with comprehensive analytical data and surface treatment validation support

Global Standards

International compliance with SEMI and surface treatment specifications for worldwide acceptance

Partnership Approach

Collaborative relationships with semiconductor manufacturers and custom silane development services