Dichlorosilane
Electronics Ultra-Pure
Electronics Chemical

Dichlorosilane (SiH2Cl2)

Premium electronics grade Dichlorosilane manufactured to meet stringent semiconductor industry specifications for CVD silicon deposition and epitaxial growth. Provides exceptional purity and consistency with ultra-high quality control for advanced semiconductor manufacturing processes.

  • Electronics Grade Purity
  • CVD Silicon Deposition
  • Epitaxial Growth Applications
  • Ultra-Low Impurities
  • Consistent Precursor Quality
  • Advanced Semiconductor Processing

Technical Specifications

Chemical Name: Dichlorosilane
Chemical Formula: SiH₂Cl₂
CAS Number: 4109-96-0
Molecular Weight: 101.01 g/mol
Physical State: Colorless gas
Boiling Point: 8.3°C at 1 atm
Melting Point: -122°C
Vapor Pressure (20°C): 1.8 atm
Density (liquid, 0°C): 1.22 g/cm³
Purity: ≥ 99.9%
Moisture (H₂O): ≤ 1 ppm
Oxygen (O₂): ≤ 1 ppm
Carbon Dioxide (CO₂): ≤ 1 ppm
Metal Impurities: ≤ 0.1 ppm each
Particle Count: ≤ 100 per L (≥0.1μm)
Storage Pressure: 2-5 bar at 20°C
Packaging Options: Lecture bottles, gas cylinders

Applications

Silicon Epitaxy
Semiconductor Processing
CVD Silicon Deposition
Polysilicon Growth
Wafer Processing
Silicon Germanium Alloys
Quality Control
Research Applications
Surface Passivation
Academic Research
Process Development
Material Analysis

Industry-Specific Grades

DRAVYOM offers specialized dichlorosilane grades tailored for specific semiconductor processing requirements, ensuring optimal purity levels, moisture control, and particle specifications for diverse silicon deposition applications.

Electronic Grade
Purity: ≥99.9% Ultra-Low Moisture: ≤1 ppm Particle Control Application: Semiconductor fab
Ultra-Pure Grade
Purity: ≥99.99% Sub-ppm Impurities Advanced Nodes: ≤10nm Application: Critical processes
Research Grade
Custom Specifications Small Cylinders: Available Flexible Volumes Application: R&D applications
Standard Grade
Purity: ≥99.5% General Applications Cost Optimized Application: General epitaxy

Quality Standards

DRAVYOM's Dichlorosilane is manufactured under stringent quality control protocols, meeting international semiconductor industry standards including SEMI, JEIDA, and ISO specifications. Our gas handling ensures consistent purity and regulatory compliance.

ISO 9001:2015 Certified Manufacturing
SEMI Gas Standards Compliance
Electronic Grade Purity
Advanced Gas Analysis
Moisture-Free Handling
Lot-to-Lot Consistency
Complete Certificate of Analysis
Safe Gas Handling & Delivery

Advanced Chemical Properties & Performance

Electronic Grade Dichlorosilane exhibits exceptional chemical properties essential for precision semiconductor epitaxy applications. The ultra-pure composition and controlled molecular structure ensure reliable performance in demanding electronic manufacturing processes.

Epitaxial Properties
Growth Rate: 0.5-3.0 µm/min
Temperature Range: 900-1150°C
Film Quality: Single crystal epitaxy
Doping Compatibility: B, P, As, Sb compatible
Physical Properties
Boiling Point: 8.2°C at 1 atm
Vapor Pressure: 1520 mmHg at 20°C
Molecular Weight: 101.01 g/mol
Density (liquid): 1.22 g/cm³ at 0°C
Process Performance
Deposition Uniformity: ±2% across wafer
Silicon Utilization: 85-95% efficiency
Surface Roughness: < 0.5 nm RMS
Defect Density: < 0.1 defects/cm²
Purity Specifications
Minimum Purity: ≥ 99.9999% (6N)
Total Metallic Impurities: ≤ 10 ppb
Moisture Content: ≤ 1 ppm
Carbon Content: ≤ 100 ppb
Stability Properties
Shelf Life: 2 years (proper storage)
Storage Pressure: < 200 psig
Thermal Stability: Stable to 1200°C
Chemical Stability: Inert atmosphere required

Performance Characteristics

Detailed performance metrics demonstrate Electronic Grade Dichlorosilane superiority in epitaxy applications with exceptional film quality, growth uniformity, and process reliability.

Film Quality

Single crystal epitaxial growth

Superior crystalline structure
Growth Uniformity

±2% thickness across wafer

Excellent uniformity control
Growth Rate

0.5-3.0 µm/min (controllable)

Flexible process conditions
Temperature Window

900-1150°C operation

Wide process flexibility
Silicon Utilization

85-95% efficiency

High material efficiency
Defect Control

< 0.1 defects/cm² achieved

Ultra-low defect density

Safety Information

Highly toxic and corrosive gas that reacts violently with water forming hydrochloric acid. Pyrophoric material that ignites spontaneously in air. Handle only in properly designed gas handling systems with appropriate safety equipment including emergency gas handling procedures.

Toxic
Pyrophoric
Corrosive

Storage & Handling

Store in specialized gas cylinders in a cool, dry, well-ventilated area away from incompatible materials. Handle only in properly designed gas cabinets with appropriate leak detection and emergency shutdown systems. Use only compatible gas handling equipment.

Cool storage (< 25°C)
Excellent ventilation
Specialized gas cylinders
Keep away from moisture

Chemical Mechanisms & Reaction Pathways

Dichlorosilane exhibits reactive chlorosilane chemistry through hydrolysis and thermal decomposition mechanisms, enabling controlled silicon deposition and surface modification in semiconductor applications with predictable reaction kinetics.

Hydrolysis Reactions

H₂SiCl₂ + H₂O → SiO₂ + HCl (controlled reaction with moisture)

Precise moisture control for silicon dioxide formation
Thermal Decomposition

High-temperature silicon deposition and chlorine elimination

Controlled CVD process for silicon films
Surface Reactions

Silicon-chlorine bond formation and surface passivation

Optimized for semiconductor surface modification
Gas Phase Chemistry

Controlled vapor transport and reactivity management

Precise gas handling for uniform processing

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures global semiconductor facility access with complete documentation packages supporting international electronics manufacturing standards and chemical vapor deposition process qualifications.

SEMI Standards

Semiconductor Equipment and Materials International compliance

CVD Specifications

Chemical Vapor Deposition equipment and process standards

Gas Handling Standards

Specialty gas handling and safety protocol specifications

Transport Regulations

Hazardous material transport and shipping compliance

Process Validation

Supported CVD process qualification documentation

SDS Documentation

Multi-language Safety Data Sheets (16 sections, GHS compliant)

Technical Support & Value-Added Services

DRAVYOM's semiconductor process team provides comprehensive CVD support, gas handling assistance, and analytical services to maximize dichlorosilane performance in your specific semiconductor manufacturing applications.

Process Development
  • CVD process optimization support
  • Gas flow and pressure guidance
  • Deposition rate optimization and validation
  • Custom gas mixture development
Analytical Services
  • Gas purity analysis and monitoring
  • Film quality assessment
  • Contamination analysis and testing
  • CVD process qualification support
Technical Support
  • Gas handling troubleshooting consultation
  • Equipment compatibility guidance
  • Safety training and protocols
  • Semiconductor CVD best practices
Supply Solutions
  • Specialized gas delivery systems
  • Emergency gas supply arrangements
  • Custom cylinder configurations
  • Global specialty gas network

Environmental Impact & Sustainability

Our dichlorosilane production emphasizes environmental responsibility through sustainable manufacturing practices, waste minimization, and comprehensive environmental impact management for semiconductor gas operations.

Waste Minimization

Optimized synthesis with minimal waste generation

Emission Control

Advanced gas scrubbing and neutralization systems

Clean Production

Energy-efficient manufacturing with emission controls

Safe Disposal

Comprehensive guidance for specialty gas waste management

ISO 14001

Environmental management system certified production

Cylinder Recycling

Gas cylinder return and recycling programs

Manufacturing Excellence & Quality Control

DRAVYOM's state-of-the-art specialty gas manufacturing facility employs advanced purification technology and continuous monitoring systems to ensure consistent dichlorosilane quality and performance across all production batches.

Production Process

Advanced distillation and purification in controlled atmosphere environment

Multi-stage purification for electronic grade quality
Quality Testing

20-point analytical testing protocol including impurities and trace moisture

GC-MS verification and performance validation
Quality Systems

ISO 9001:2015 quality management with specialty gas industry accreditation

Continuous improvement and process validation
Packaging Control

Specialized gas cylinders with inert atmosphere protection

Contamination prevention and purity assurance

Market Applications & Performance Data

Comprehensive semiconductor fabrication data demonstrating dichlorosilane effectiveness across diverse CVD applications with quantified performance metrics and process validations.

Semiconductor Fabs
Deposition Rate: 100-500 Å/min Uniformity: ±2% across wafer Purity: >99.999% gas purity
CVD Applications
Film Quality: Low stress silicon films Coverage: 100% step coverage Repeatability: <1% batch variation
Solar Manufacturing
Efficiency: 20%+ cell efficiency Throughput: 40% faster processing Yield: 99%+ process success

DRAVYOM Competitive Advantages

Superior Purity

Consistently exceeds semiconductor specifications with ultra-pure gas formulations and exceptional CVD performance

Reliable Supply

Guaranteed availability with strategic inventory management and specialty gas production scheduling

CVD Expertise

Dedicated CVD process team provides method development and troubleshooting support

Quality Assurance

Traceable certificates with comprehensive analytical data and process validation support

Global Standards

International compliance with SEMI and specialty gas specifications for worldwide acceptance

Partnership Approach

Collaborative relationships with semiconductor manufacturers and custom gas development services