Ceria Slurries
Electronics Ultra-Pure
Electronics Chemical

Ceria (CeO2) Slurries

Premium electronics grade Ceria slurries manufactured to meet stringent semiconductor industry specifications for CMP polishing and surface finishing. Provides exceptional polishing performance with ultra-high purity and consistent particle distribution for advanced semiconductor manufacturing processes.

  • Electronics Grade Purity
  • Precision CMP Polishing
  • Controlled Particle Size
  • Superior Surface Finish
  • Consistent Slurry Stability
  • Advanced Semiconductor Applications
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Technical Specifications

Active Component: Cerium Oxide (CeO₂)
CAS Number: 1306-38-3
Particle Size: 30-200 nm (custom sizes available)
Solid Content: 5-35% by weight
pH Value: 3.5-10.5 (adjustable)
Viscosity (20°C): ≤ 50 cP
Density (20°C): 1.05-1.25 g/cm³
Surface Area: 40-120 m²/g
Removal Rate (STI): 1000-3000 Å/min
Selectivity (Oxide:Nitride): 10:1-50:1
Metal Impurities: ≤ 0.1 ppm each
Large Particle Count: ≤ 20 per mL (≥0.5μm)
Shelf Life: 12 months at 4-25°C
Additive Package: Stabilizers, pH adjusters
Filterability: 0.1 μm membrane compatible
Operating Temperature: 18-60°C
Packaging Options: 1L, 20L, 200L containers

Applications

STI CMP
Oxide Polishing
Semiconductor CMP
Wafer Planarization
ILD CMP
PMD Polishing
Quality Control
Research Applications
Surface Smoothing
Academic Research
Process Development
Material Characterization

Industry-Specific Grades

DRAVYOM offers specialized ceria slurry formulations tailored for specific CMP requirements, ensuring optimal removal rates, selectivity, and surface quality for diverse semiconductor applications.

STI Grade
Particle Size: 50-80 nm Solid Content: 12% High Selectivity: 30:1 Application: STI CMP
ILD Grade
Particle Size: 30-60 nm Solid Content: 8% High Removal Rate Application: ILD polishing
Research Grade
Custom Formulations Small Volumes: Available Various pH: Available Application: R&D applications
Production Grade
High Volume: Available Consistent Performance Long Shelf Life Application: Manufacturing

Quality Standards

DRAVYOM's Ceria CMP Slurries are manufactured under stringent quality control protocols, meeting international semiconductor industry standards including SEMI, ITRS, and ISO specifications. Our formulations ensure consistent polishing performance and regulatory compliance.

ISO 9001:2015 Certified Manufacturing
SEMI Standards Compliance
Controlled Particle Distribution
Advanced Particle Analysis
Ultra-Low Metal Contamination
Batch-to-Batch Consistency
Complete Certificate of Analysis
Temperature-Controlled Delivery

Advanced Chemical Properties & Performance

Electronic Grade Ceria Slurries exhibit exceptional chemical properties essential for CMP applications. The ultra-pure composition and precise particle characteristics ensure reliable performance in demanding semiconductor manufacturing processes.

CMP Properties
Removal Rate: 100-1000 Å/min (tunable)
Particle Size: 20-200 nm (controlled)
Surface Finish: < 1 nm RMS
Uniformity: ±2% across wafer
Physical Properties
pH Value: 8.0-9.5
Viscosity (25°C): 2.0-4.0 cP
Density: 1.20-1.30 g/cm³
Solids Content: 8-15% w/w
Process Performance
Selectivity: Excellent material selectivity
Defect Density: Ultra-low micro-scratching
Planarization: Superior local/global
Process Window: Wide operational range
Purity Specifications
Total Metallic Impurities: ≤ 0.05 ppm
Large Particle Count: ≤ 50 (>0.5µm)/mL
Organic Content: Controlled additives only
Endotoxin Level: ≤ 0.05 EU/mL
Stability Properties
Shelf Life: 8 months (unopened)
Storage Temperature: 15-25°C
Particle Stability: No agglomeration
pH Drift: ±0.1 units/month

Performance Characteristics

Detailed performance metrics demonstrate Electronic Grade Ceria Slurries superiority in CMP applications with exceptional planarization efficiency, defect control, and process repeatability.

Planarization Efficiency

Global: 98%+, Local: 99%+ planarization

Superior surface uniformity achievement
Defect Control

Micro-scratches: <5 defects/cm²

Exceptional surface quality
Removal Rate Control

Uniformity: ±2% across wafer

Precise material removal control
Process Stability

Temperature range: 15-40°C operation

Consistent across conditions
Batch Consistency

Variation: ±1% between lots

Exceptional reproducibility
Process Life

8-16 hours continuous operation

Extended operational window

Safety Information

Alkaline slurry that may cause eye and skin irritation. Handle with appropriate protective equipment including safety goggles, chemical-resistant gloves, and protective clothing. Ensure adequate ventilation and emergency procedures are in place.

Irritant
Eye Irritant
Skin Irritant

Storage & Handling

Store in original containers in a cool, dry area with continuous agitation capability. Keep containers tightly sealed and protect from freezing. Use appropriate mixing equipment to maintain particle suspension and prevent settling.

Cool storage (15-25°C)
Continuous gentle agitation
Protect from freezing
Original containers only

Chemical Mechanisms & Reaction Pathways

Electronic Grade Ceria Slurries exhibit controlled abrasive polishing mechanisms through optimized particle interaction and chemical-mechanical planarization pathways, enabling precise semiconductor processing applications with predictable material removal rates and surface smoothing.

Abrasive Polishing

Controlled mechanical abrasion through ceria particle interaction

Precise surface planarization for semiconductor devices
Chemical-Mechanical

Combined chemical and mechanical material removal

Essential for uniform surface finish
Particle Interaction

Controlled ceria particle surface interaction mechanisms

Enables precise material removal control
Surface Smoothing

Optimized surface planarization through controlled polishing

Critical for semiconductor device fabrication

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures global semiconductor manufacturing access with complete documentation packages supporting international standards and electronic-grade specifications.

SEMI Standards

Semiconductor Equipment and Materials International specifications compliance

ISO 9001:2015

International quality management system certification

Electronic Grade

Ultra-pure specifications for semiconductor manufacturing

REACH Registration

European Union chemical regulation compliance

Process Validation

Supported semiconductor process validation documentation

SDS Documentation

Multi-language Safety Data Sheets (16 sections, GHS compliant)

Technical Support & Value-Added Services

DRAVYOM's semiconductor chemistry team provides comprehensive process support, troubleshooting assistance, and engineering services to optimize Electronic Grade Ceria Slurries performance in your specific manufacturing applications.

Process Development
  • Semiconductor process optimization support
  • Polishing procedure guidance
  • Process reliability validation
  • Custom particle size procedures
Analytical Services
  • Certificate of Analysis verification
  • Custom particle analysis
  • Trace contamination testing
  • Process validation support
Technical Support
  • Process troubleshooting consultation
  • Storage and handling guidance
  • Safety training and protocols
  • Manufacturing best practices
Supply Solutions
  • Consistent batch scheduling
  • Emergency supply arrangements
  • Custom formulation options
  • Global distribution network

Environmental Impact & Sustainability

Our Electronic Grade Ceria Slurries production emphasizes environmental responsibility through sustainable manufacturing practices, waste minimization, and comprehensive environmental impact management for semiconductor operations.

Waste Minimization

Optimized production with minimal waste generation

Water Treatment

Advanced wastewater treatment and recycling systems

Clean Production

Energy-efficient synthesis with emission controls

Safe Disposal

Comprehensive guidance for manufacturing waste management

ISO 14001

Environmental management system certified production

Container Recycling

Chemical container return and recycling programs

Manufacturing Excellence & Quality Control

DRAVYOM's state-of-the-art semiconductor chemical manufacturing facility employs advanced purification technology and continuous monitoring systems to ensure consistent Electronic Grade Ceria Slurries quality and performance across all production batches.

Production Process

Advanced slurry formulation and particle processing

Precision particle size control for CMP applications
Quality Testing

Comprehensive analytical testing including particle size and contamination

Laser diffraction and contamination analysis
Quality Systems

ISO 9001:2015 quality management with semiconductor facility certification

Continuous improvement and process validation
Packaging Control

Specialized containers with agitation systems

Particle suspension and contamination prevention

Market Applications & Performance Data

Comprehensive semiconductor manufacturing data demonstrating Electronic Grade Ceria Slurries effectiveness across diverse applications with quantified performance metrics and process validations.

CMP Processing
Precision: ±0.1% removal rate control Purity: >99.9% particle grade Yield: 99.8%+ process success
Semiconductor Polishing
Efficiency: 99.9%+ surface uniformity Selectivity: Controlled removal rates Reliability: 100% batch consistency
Planarization
Performance: Zero defect contribution Validation: 100% process qualification Efficiency: 35% faster processing

DRAVYOM Competitive Advantages

Superior Purity

Consistently exceeds semiconductor specifications with ultra-low impurities and exceptional electronic performance

Reliable Supply

Guaranteed availability with strategic inventory management and electronic-grade production scheduling

Process Expertise

Dedicated semiconductor chemistry team provides process development and optimization support

Quality Assurance

Traceable certificates with comprehensive analytical data and process validation support

Global Standards

International compliance with SEMI, ISO, and electronics specifications for worldwide acceptance

Partnership Approach

Collaborative relationships with semiconductor manufacturers and custom grade development services