Buffered Oxide Etch (BOE)
Electronic Premium
Electronic Grade Chemical

Buffered Oxide Etch (BOE)

Ultra-pure electronic grade Buffered Oxide Etch manufactured to meet stringent semiconductor industry specifications. Our electronic grade BOE provides exceptional etching performance with ultra-low contamination for critical semiconductor processing and advanced electronics manufacturing.

  • Electronic Grade Purity
  • Ultra-Low Contamination
  • Superior Etching Performance
  • Semiconductor Compatible
  • Precise Etch Control
  • Consistent Quality

Technical Specifications

Chemical Name: Buffered Oxide Etchant
Composition: HF + NH₄F (6:1 ratio)
HF Concentration: 49% electronic grade
NH₄F Concentration: 40% electronic grade
Physical State: Clear, colorless liquid
pH Value: 4.5-5.0
Density (20°C): 1.10 g/cm³
Etch Rate (SiO₂): 100-150 Å/min
Selectivity (SiO₂:Si): >100:1
Metal Impurities: ≤ 0.1 ppm each
Chloride (Cl): ≤ 1 ppm
Sulfate (SO₄): ≤ 1 ppm
Nitrate (NO₃): ≤ 1 ppm
Phosphate (PO₄): ≤ 1 ppm
Particle Count: ≤ 100 per mL (≥0.5μm)
Working Temperature: 20-25°C
Packaging Options: 1L, 4L, 20L PTFE bottles

Applications

Oxide Etching
Semiconductor Processing
Wafer Cleaning
Surface Preparation
Pattern Etching
Mask Removal
Quality Control
Research Applications
Controlled Etching
Academic Research
Process Development
Material Analysis

Industry-Specific Grades

DRAVYOM offers specialized BOE formulations tailored for specific etching requirements, ensuring optimal selectivity and etch rate control for diverse semiconductor and microelectronics applications.

Standard BOE
Ratio: 6:1 (NH₄F:HF) Etch Rate: 100-150 Å/min Selectivity: >100:1 Application: General oxide etching
Slow Etch BOE
Ratio: 10:1 (NH₄F:HF) Etch Rate: 50-75 Å/min High Selectivity: >200:1 Application: Controlled etching
Research Grade
Custom Ratios: Available Ultra-Low Metals: ≤ 0.01 ppm Small Volumes: Available Application: R&D applications
Production Grade
Consistent Performance Large Volume: Available Batch Consistency: Guaranteed Application: Manufacturing

Quality Standards

DRAVYOM's Electronic Grade BOE is manufactured under stringent quality control protocols, meeting international electronic industry standards including SEMI, JEIDA, and ISO specifications. Our formulations ensure consistent etching performance and regulatory compliance.

ISO 9001:2015 Certified Manufacturing
SEMI Standards Compliance
Electronic Grade Components
Advanced Analytical Testing
Ultra-Low Metal Contamination
Batch-to-Batch Consistency
Complete Certificate of Analysis
Safe Handling & Delivery

Advanced Chemical Properties & Performance

Electronic Grade Buffered Oxide Etch exhibits exceptional chemical properties essential for semiconductor applications. The precisely buffered composition ensures reliable performance with controlled etch selectivity in demanding electronic manufacturing processes.

Chemical Properties
HF Content: 5-7% w/w
NH₄F Content: 40-50% w/w
pH Value: 4.5-5.5 (buffered)
Buffering Capacity: High acid buffering
Physical Properties
Density (25°C): 1.12-1.18 g/cm³
Viscosity (25°C): 1.2-1.8 cP
Freezing Point: -15°C to -10°C
Vapor Pressure (20°C): Low vapor pressure
Etching Performance
SiO₂ Etch Rate: 100-200 nm/min
Si₃N₄ Selectivity: 100:1 typical
Surface Quality: Smooth, uniform etching
Process Window: Wide operational range
Purity Specifications
Total Metallic Impurities: ≤ 0.1 ppm
Organic Content: ≤ 0.001%
Particle Count: ≤ 100 (>0.5µm)/mL
Sulfate (SO₄²⁻): ≤ 0.1 ppm
Stability Properties
Shelf Life: 18 months (unopened)
Storage Temperature: 15-25°C
pH Stability: ±0.1 pH units/month
Container Compatibility: HDPE, PTFE-lined

Performance Characteristics

Detailed performance metrics demonstrate Electronic Grade BOE superiority in semiconductor applications with exceptional selectivity, process reliability, and consistent etching performance.

High Selectivity

100:1 SiO₂ to Si₃N₄ selectivity

Superior material discrimination
Etch Performance

Uniform, controlled etch rates

Consistent material removal
Process Control

Temperature range: 15-40°C

Stable across conditions
Batch Consistency

Variation: ±2% HF content

Exceptional lot-to-lot uniformity
pH Stability

Excellent buffering capacity

Maintained process conditions
Long Shelf Life

18-month stability guaranteed

Extended operational availability

Safety Information

Highly corrosive solution containing hydrofluoric acid that can cause severe burns to skin, eyes, and respiratory tract. Handle in well-ventilated areas with appropriate protective equipment including HF-resistant gloves, safety goggles, and protective clothing. Ensure emergency procedures and calcium gluconate antidote are available.

Highly Corrosive
Eye Damage
Severe Skin Burns

Storage & Handling

Store in original HDPE or PTFE-lined containers in a cool, dry, well-ventilated area away from incompatible materials. Keep containers tightly closed and protect from temperature extremes. Use HF-compatible equipment for all handling operations.

Cool storage (15-25°C)
Excellent ventilation required
HF-compatible containers only
Calcium gluconate available

Chemical Mechanisms & Reaction Pathways

Electronic Grade Buffered Oxide Etch exhibits controlled etching properties through buffered hydrofluoric acid chemistry, enabling precise semiconductor processing applications with predictable dissolution mechanisms and controlled oxide removal.

Oxide Dissolution

Controlled silicon dioxide etching: SiO₂ + 6HF → H₂SiF₆ + 2H₂O

Precise oxide removal for semiconductor processing
Buffered Chemistry

Ammonium fluoride buffering for controlled etch rates

Essential for uniform and predictable etching
Selective Etching

High selectivity for silicon dioxide over silicon

Enables precise material removal control
Surface Cleaning

Removes native oxide and contaminants from silicon surfaces

Critical for semiconductor device fabrication

Regulatory Compliance & Documentation

Comprehensive regulatory compliance ensures global semiconductor manufacturing access with complete documentation packages supporting international standards and electronic-grade specifications.

SEMI Standards

Semiconductor Equipment and Materials International specifications compliance

ISO 9001:2015

International quality management system certification

Electronic Grade

Ultra-pure specifications for semiconductor manufacturing

REACH Registration

European Union chemical regulation compliance

Process Validation

Supported semiconductor process validation documentation

SDS Documentation

Multi-language Safety Data Sheets (16 sections, GHS compliant)

Technical Support & Value-Added Services

DRAVYOM's semiconductor chemistry team provides comprehensive process support, troubleshooting assistance, and engineering services to optimize Electronic Grade Buffered Oxide Etch performance in your specific manufacturing applications.

Process Development
  • Semiconductor process optimization support
  • Etching procedure guidance
  • Process reliability validation
  • Custom etch rate procedures
Analytical Services
  • Certificate of Analysis verification
  • Custom concentration analysis
  • Trace metal contamination testing
  • Process validation support
Technical Support
  • Process troubleshooting consultation
  • Storage and handling guidance
  • Safety training and protocols
  • Manufacturing best practices
Supply Solutions
  • Consistent batch scheduling
  • Emergency supply arrangements
  • Custom formulation options
  • Global distribution network

Environmental Impact & Sustainability

Our Electronic Grade Buffered Oxide Etch production emphasizes environmental responsibility through sustainable manufacturing practices, waste minimization, and comprehensive environmental impact management for semiconductor operations.

Waste Minimization

Optimized production with minimal waste generation

Water Treatment

Advanced wastewater treatment and recycling systems

Clean Production

Energy-efficient synthesis with emission controls

Safe Disposal

Comprehensive guidance for manufacturing waste management

ISO 14001

Environmental management system certified production

Container Recycling

Chemical container return and recycling programs

Manufacturing Excellence & Quality Control

DRAVYOM's state-of-the-art semiconductor chemical manufacturing facility employs advanced purification technology and continuous monitoring systems to ensure consistent Electronic Grade Buffered Oxide Etch quality and performance across all production batches.

Production Process

Advanced formulation and purification in controlled environment

Precise buffered chemistry for electronic grade quality
Quality Testing

Comprehensive analytical testing protocol including HF content and metals

Ion chromatography and ICP-MS analysis
Quality Systems

ISO 9001:2015 quality management with semiconductor facility certification

Continuous improvement and process validation
Packaging Control

HF-compatible containers with chemical-resistant packaging

Safe handling and contamination prevention

Market Applications & Performance Data

Comprehensive semiconductor manufacturing data demonstrating Electronic Grade Buffered Oxide Etch effectiveness across diverse applications with quantified performance metrics and process validations.

Oxide Etching
Precision: ±0.5% etch rate control Purity: >99.99% electronic grade Yield: 99.7%+ process success
Semiconductor Cleaning
Efficiency: 99.9%+ oxide removal Selectivity: >1000:1 SiO₂:Si selectivity Reliability: 100% batch consistency
Surface Preparation
Performance: Zero defect contribution Validation: 100% process qualification Efficiency: 50% faster processing

DRAVYOM Competitive Advantages

Superior Purity

Consistently exceeds semiconductor specifications with ultra-low impurities and exceptional electronic performance

Reliable Supply

Guaranteed availability with strategic inventory management and electronic-grade production scheduling

Process Expertise

Dedicated semiconductor chemistry team provides process development and optimization support

Quality Assurance

Traceable certificates with comprehensive analytical data and process validation support

Global Standards

International compliance with SEMI, ISO, and electronics specifications for worldwide acceptance

Partnership Approach

Collaborative relationships with semiconductor manufacturers and custom grade development services

Electronics Excellence Demands Ultra-Pure Chemicals

Get electronic grade Buffered Oxide Etch for semiconductor manufacturing, explore custom formulations, or discuss process optimization with our electronics specialists.

Get Electronic Grade Quote